|
½ÃÀ庸°í¼
¼¼°èÀÇ CMP(Chemical Mechanical Polishing) Àåºñ ¡¤¼ÒÀç ½ÃÀå
Chemical Mechanical Polishing (CMP) Equipment and Materials
| ¸®¼Ä¡»ç |
BCC Research |
| ¹ßÇàÀÏ |
2008³â 10¿ù |
»óǰÄÚµå |
63233 |
| ÆäÀÌÁö Á¤º¸ |
237 pages |
| °¡°Ý |
|
|
BCC Research ¿¡¼ 2008³â 10¿ù ¿¡ ¹ßÇàÇÑ ¡¸¼¼°èÀÇ CMP(Chemical Mechanical Polishing) Àåºñ ¡¤¼ÒÀç ½ÃÀ塹 º¸°í¼´Â 237 pages·Î ±¸¼ºµÇ¾î, US $4,850 ºÎÅÍ ±¸¸Å °¡´ÉÇÕ´Ï´Ù.
CMP(Chemical Mechanical Polishing)ÀÇ ±â¼ú¡¤¾ÖÇø®ÄÉÀÌ¼Ç µ¿Çâ, CMP & Post CMP Àåºñ, ½½·¯¸®, ÆÐµå & ¼Ò¸ðǰ ½ÃÀå¿¡ ´ëÇØ Á¶»ç ºÐ¼®ÇÏ°í ½ÃÀå ±Ô¸ð ½ÇÀû¡¤¿¹Ãø(¡2012³â), ÁÖ¿ä ½Ç¼ö¿äÀÚ, ±â¼úÀû °úÁ¦, R&D µ¿Çâ, ÁÖ¿ä Á¦Á¶¾÷ÀÚ ÇÁ·ÎÆÄÀÏ µî¿¡ ´ëÇØ Á¤¸®ÇÏ¿© ÀüÇØµå¸³´Ï´Ù. Á¦2Àå °³¿ä - ¼·Ð
- CMPÀÇ °æÀ§
- ÇÁ·Î¼¼½º ¹× Àåºñ
- ¿¬¸¶
- Post CMP Ŭ¸®´×
- CMPÀÇ ±âÁ¸¡¤½Å±Ô ¾ÖÇø®ÄÉÀÌ¼Ç µî
Á¦3Àå ¼¼°è ½ÃÀå - ºÐ¼® °³¿ä
- ¼¼°è ½ÃÀå ¿ä¾à
- ½ÃÀå ±¸ºÐ : Á¦Ç° Ä«Å×°í¸®
- ½ÃÀå ±¸ºÐ : Áö¿ª
- CMP Àåºñ
- ±âº»ÀûÀÎ Àåºñ ¼³°è
- ÇöÀçÀÇ ±â¼úÀû °úÁ¦
- Ãֽбâ¼ú °³¹ß : 2005³â¡ÇöÀç
- ÇöÀçÀÇ ½ÃÀå »óȲ
- ½ÃÀå ¼ºÀå µ¿Çâ
- ½ÃÀå Àü¸Á : CMP¡¤Post CMP Àåºñ
- CMP ½½·¯¸®
- 񃬣
- ÇöÀçÀÇ ±â¼úÀû °úÁ¦
- Ãֽбâ¼ú °³¹ß : 2005³â¡ÇöÀç
- ÇöÀçÀÇ ½ÃÀå »óȲ
- ½ÃÀå ¼ºÀå µ¿Çâ
- ½ÃÀå Àü¸Á : CMP ½½·¯¸®
- ±âŸ CMP ¼Ò¸ðǰ
- 񃬣
- ÇöÀçÀÇ ±â¼úÀû °úÁ¦
- Ãֽбâ¼ú °³¹ß : 2005³â¡ÇöÀç
- ÇöÀçÀÇ ½ÃÀå »óȲ
- ½ÃÀå ¼ºÀå µ¿Çâ
- ½ÃÀå Àü¸Á : CMP ÆÐµå¡¤±âŸ ¼Ò¸ðǰ
Á¦4Àå ¼¼°è »ê¾÷ ±¸Á¶ - CMP Àåºñ¡¤¼ÒÀç Á¦°ø¾÷ü
- CMP Àåºñ¡¤¼ÒÀç : Áö¿ªº° Á¦Á¶
- CMP Àåºñ¡¤¼ÒÀç : Áö¿ªº° ¼Òºñ
- ±â¾÷ ÇÁ·ÎÆÄÀÏ
- ÁÖ¿ä±â¾÷ÀÇ ½ÃÀå Á¡À¯À²
- CMP¡¤Post CMP Àåºñ
- CMP ½½·¯¸®
- ÆÐµå¡¤±âŸ CMP ¼Ò¸ðǰ
Á¦5Àå »ê¾÷ °æÇÕ - °³¹ß Ȱµ¿
- ¹Ì±¹
- À¯·´
- ¾Æ½Ã¾ÆÅÂÆò¾ç
- ±âŸ °íÂû
- ºñ¿ë
- ǰÁú
- 񃬣
- Á¦Á¶ ´É·Â
- ÁÖ¿ä ¼ºÀå ½ÃÀå
- ½ÃÀå ¼ºÀå ¿äÀÎ µî
lsh
|