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¹ÝµµÃ¼ ÈÇмÒÀç ºÐ¼®(2009³â) : Gas Chemical
Semiconductor Material Analysis 2009: Gas Chemical
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DisplayBank ¿¡¼ 2009³â 09¿ù ¿¡ ¹ßÇàÇÑ ¡¸¹ÝµµÃ¼ ÈÇмÒÀç ºÐ¼®(2009³â) : Gas Chemical¡¹ º¸°í¼´Â US $5,500 ºÎÅÍ ±¸¸Å °¡´ÉÇÕ´Ï´Ù.
Chemical Vapor Deposition(ÈÇÐÁõÂø)ÀÇ °³¿ä¿Í ÇÔ²² ¼¼°è ¹ÝµµÃ¼ Á¦Á¶¾÷üÀÇ µ¿Çâ, ¼¼°è ¹× Áö¿ªº° Gas Chemical ½ÃÀåÀÇ µ¿ÇâÀ» Á¤¸®ÇÏ¿© ÀüÇØµå¸³´Ï´Ù. Á¦1Àå Chemical Vapor Deposition - Gas ChemicalÀÇ Á¾·ù ¹× ¿ªÇÒ
- CVD °øÁ¤, Dry Etching, Chamber Cleaning °øÁ¤ ¼Ò°³
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Á¦3Àå Àü¼¼°è Gas Chemical ½ÃÀå µ¿Çâ - ¹ÝµµÃ¼ °øÁ¤¿ë Gas ChemicalÀÇ 2008~2011³â±îÁö ¹Ý±â±âÁØ ½ÃÀå µ¿Çâ ¹× Àü¸Á ºÐ¼®(¹°·® ¹× ±Ý¾× ±âÁØ)
- NF3, SiH4, DCS, NH3, WF6, CF(CF4, C2F6, C3F8 µî)ÀÇ 2008~2011³â±îÁö ¹Ý±â±âÁØ ½ÃÀå µ¿Çâ ¹× Àü¸Á ºÐ¼®(¹°·® ¹× ±Ý¾× ±âÁØ)
- À§ 6°¡Áö ¾ÆÀÌÅÛÀÇ ¹Ì±¹(ºÏ¹Ì), À¯·´, Çѱ¹, ÀϺ», ´ë¸¸, Áß±¹ ¹× ±âŸ Áö¿ªÀÇ °¢ ¼ÒÀ纰 2008~2011³â±îÁö ¹Ý±â±âÁØ ½ÃÀå µ¿Çâ ¹× Àü¸Á ºÐ¼®(¹°·® ¹× ±Ý¾× ±âÁØ)
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- NF3, SiH4, DCS, NH3, WF6, CF(CF4, C2F6, C3F8 µî)ÀÇ °¢ ¾÷ü »ç¾÷À庰 »ç¿ë·® ºÐ¼® (2008³â ¹Ý±â±âÁØ ½ÇÁ¦ »ç¿ë·® ¹× 2009³â ¹Ý±â±âÁØ ¿¹Ãø »ç¿ë·®)
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