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Semiconductor Material Analysis 2009: Wet Chemical
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Abstract
Wet Chemical: Cleaning Solution, Etching Solution, Stripper, Developer,
Plating Solution (Cu, Au)
In 2009, Displaybank Research Group prepared Research Report regarding the
Semiconductor Industry. First of all, we plan to cover chemical material, one
of key elements in the semiconductor industry. As the first for the ongoing
series, Displaybank has published “Semiconductor Chemical Material
Analysis: Wet Chemical” that discusses Cleaning and Etching Solutions
(H3PO4, HF, BHF (BOE), H2O2, H2SO4, and etc.), Developer (TMAH), Stripper,
Plating Solution (Cu and Au).
Table of Contents
Chapter 1. Wet Chemical for Semiconductor
- 1. Introduction
- 2. Semiconductor Manufacturing Process
- 3. Cleaning
- 3-1. Cleaning Process
- 3-2. Wet Cleaning
- 4. Photolithography
- 4-1. Photolithography Process
- 4-2. Develop Photoresist
- 4-3. PR Stripping
- 5. Etching
- 5-1. Wet Etch Process
- 5-2. Dry Etch Process
- 6. Copper Electroplating
Chapter 2. Major Semiconductor Maker
- 1. Semiconductor Maker
- 1-1. Semiconductor Maker by Region
- 1-2. Semiconductor by Product Category
- 2. Major Semiconductor Maker(25#)
- 2-1. Intel, Samsung, Texas Instruments, Toshiba
- 2-2. STMicroelectronics, TSMC, Hynix, Renesas, SONY
- 2-3. NXP, AMD, Infineon, NEC, Freescale , Micron Technology,
Fujitsu
- 2-4. IBM, Elpida Memory, Panasonic, UMC, Sharp, Spansion,
Powerchip, ProMOS, Nanya
Chapter 3. Worldwide Wet Chemical Market Trend
- 1. Worldwide Market Trend: 2008~2011
- 1-1. Cleaning & Etching Material
- 1-2. Stripper
- 1-3. Developer (TMAH)
- 1-4. Plating Solution: Cu & Au
- 1-5. Overall
- 2. Market Trend by Region: 2008~2011
- 2-1. Cleaning & Etching Material
- 2-2. Stripper
- 2-3. Developer (TMAH)
- 2-4. Plating Solution: Cu & Au
Chapter 4. Market Trend in Korea
- 1. Fab Status
- 1-1. Samsung: Product, Capa, Wafer Size, Input Wafer Trend,
Information
- 1-2. Hynix & Others: Product, Capa, Wafer Size, Input Wafer
Trend, Information
- 2. Market Trend: HF
- 2-1. Market Trend by Line : Volume
- 2-2. Market Trend by Line : Amount
- 2-3. Supply Chain
- 3. Market Trend: BHF(BOE)
- 3-1. Market Trend by Line : Volume
- 3-2. Market Trend by Line : Amount
- 3-3. Supply Chain
- 4. Market Trend: H3PO4
- 4-1. Market Trend by Line : Volume
- 4-2. Market Trend by Line : Amount
- 4-3. Supply Chain
- 5. Market Trend: H2SO4
- 5-1. Market Trend by Line: Volume
- 5-2. Market Trend by Line: Amount
- 5-3. Supply Chain
- 6. Market Trend: H2O2
- 6-1. Market Trend by Line: Volume
- 6-2. Market Trend by Line: Amount
- 6-3. Supply Chain
- 7. Market Trend: Stripper
- 7-1. Market Trend by Line: Volume
- 7-2. Market Trend by Line: Amount
- 7-3. Supply Chain
- 8. Market Trend: Developer (TMAH)
- 8-1. Market Trend by Line: Volume
- 8-2. Market Trend by Line: Amount
- 8-3. Supply Chain
- 9. Market Trend: Au Plating Solution
- 9-1. Market Trend by Line: Volume
- 9-2. Market Trend by Line: Amount
- 9-3. Supply Chain
- 10. Market Trend: Cu Plating Solution
- 10-1. Market Trend by Line: Volume
- 10-2. Market Trend by Line: Amount
- 10-3. Supply Chain
Chapter 5. Market Analysis
- 1. Market Analysis: Cleaning & Etching Material
- 1-1. Market Forecast
- 1-2. Price Trend : HF & BHF, H3PO4, H3PO4, H2SO4
- 1-3. Industry Analysis
- 2. Market Analysis: Stripper
- 2-1. Market forecast
- 2-2. Price Trend
- 2-3. Industry Analysis
- 3. Market Analysis: Cu Plating Solution
- 3-1. Market Forecast
- 3-2. Price Trend
- 3-3. Industry Trend
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