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SK-Electronics, Toppan Photomask, Xiamen Powerway Advanced Material, Nippon Filcon, KLA Corporation µî 10°³ ÀÌ»óÀÇ ÁÖ¿ä °æÀï»ç ÇÁ·ÎÆÄÀϰú °æÀï »óȲÀ» ºÐ¼®
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The Photomask market is poised for remarkable growth, projected to surpass USD 3 billion by 2030, with a CAGR of approximately 5% from a value of USD 2 billion in 2022. The continuous progress of semiconductor technology, the increase in consumer electronics usage, and the ongoing trend of electronics miniaturization are all contributing to the demand for photomask materials
This report provides a deep-dive into the following points in this detailed assessment of the Photomask materials market:
Overview on the key materials used as photomask material:
Insight on current (2022) and forecasted (2030) global market for Photomask including an analysis of the key trends and drivers impacting market growth and choice of materials.
Global market segmentation by material type
Global market segmentation by key materials used – Quartz, Soda Lime.
Key Selection criteria or Performance Parameters for material selection including the voice of the customer on parameters such as Pattern Fidelity, Defect density, Alignment accuracy, etc.
Key competitor profiles and analyzing the competitor landscape of 10+ companies including SK-Electronics, Toppan Photomask, Xiamen Powerway Advanced Material, Nippon Filcon, KLA Corporation, etc.
Analyzing key patent families by major assignees in the last 4-5 years. The report also includes insights on the research focus of the patents, materials under consideration and the associated applications
Backed by extensive secondary research and validation through primary research, this report also presents a reliable view of the market outlook and factors influencing the same.