½ÃÀ庸°í¼­
»óǰÄÚµå
1376078

Æ÷Å丮¼Ò±×·¡ÇÇ Àåºñ ½ÃÀå ±Ô¸ð, Á¡À¯À², µ¿Ç⠺м® º¸°í¼­ : °øÁ¤º°, ±¤¿øº°, ÆÄÀ庰, ÃÖÁ¾»ç¿ëÀÚº°, Áö¿ªº°, ºÎ¹®º° ¿¹Ãø(2023-2030³â)

Photolithography Equipment Market Size, Share & Trends Analysis Report By Process (Ultraviolet UV, Deep Ultraviolet), By Light Source (Mercury Lamp, Fluorine Laser), By Wave Length, By End-users, By Region, And Segment Forecasts, 2023 - 2030

¹ßÇàÀÏ: | ¸®¼­Ä¡»ç: Grand View Research | ÆäÀÌÁö Á¤º¸: ¿µ¹® 90 Pages | ¹è¼Û¾È³» : 2-10ÀÏ (¿µ¾÷ÀÏ ±âÁØ)

    
    
    




¡Ø º» »óǰÀº ¿µ¹® ÀÚ·á·Î Çѱ۰ú ¿µ¹® ¸ñÂ÷¿¡ ºÒÀÏÄ¡ÇÏ´Â ³»¿ëÀÌ ÀÖÀ» °æ¿ì ¿µ¹®À» ¿ì¼±ÇÕ´Ï´Ù. Á¤È®ÇÑ °ËÅ並 À§ÇØ ¿µ¹® ¸ñÂ÷¸¦ Âü°íÇØÁֽñ⠹ٶø´Ï´Ù.

Æ÷Å丮¼Ò±×·¡ÇÇ Àåºñ ½ÃÀå ¼ºÀå°ú µ¿Çâ

Grand View Research, Inc.ÀÇ ÃֽŠº¸°í¼­¿¡ µû¸£¸é, ¼¼°è Æ÷Å丮¼Ò±×·¡ÇÇ Àåºñ ½ÃÀå ±Ô¸ð´Â 2030³â 182¾ï 1,000¸¸ ´Þ·¯¿¡ ´ÞÇÒ °ÍÀ¸·Î ¿¹»óµË´Ï´Ù.

ÀÌ ½ÃÀåÀº 2023³âºÎÅÍ 2030³â±îÁö ¿¬Æò±Õ 6.4%ÀÇ ¼ºÀå·üÀ» ±â·ÏÇÒ °ÍÀ¸·Î ¿¹»óµË´Ï´Ù. ¹ÝµµÃ¼ ¼ÒÀÚÀÇ ¼ÒÇüÈ­, °í¼º´ÉÈ­, ¿¡³ÊÁö È¿À²¼º Çâ»ó¿¡ ´ëÇÑ Áö¼ÓÀûÀÎ ¼ö¿ä·Î ÀÎÇØ ÷´Ü Æ÷Å丮¼Ò±×·¡ÇÇ ÀåºñÀÇ Çʿ伺ÀÌ Áõ°¡Çϰí ÀÖ½À´Ï´Ù. ¹ÝµµÃ¼ ±â¼úÀÌ ¹ßÀüÇÔ¿¡ µû¶ó Á¦Á¶¾÷üµéÀº ´õ ÀÛÀº ÇÇó Å©±â¿Í °íÇØ»óµµ¸¦ »ý»êÇÒ ¼ö ÀÖ´Â Àåºñ°¡ ÇÊ¿äÇÕ´Ï´Ù.

Ŭ¶ó¿ìµå ÄÄÇ»ÆÃ°ú µ¥ÀÌÅͼ¾ÅÍÀÇ È®ÀåÀ¸·Î °í¼º´É ÇÁ·Î¼¼¼­¿Í ¸Þ¸ð¸® Ĩ¿¡ ´ëÇÑ ¼ö¿ä°¡ Áõ°¡Çϰí ÀÖ½À´Ï´Ù. ÀÌ¿¡ µû¶ó ÇÊ¿äÇÑ ¹ÝµµÃ¼¸¦ »ý»êÇϱâ À§ÇÑ Ã·´Ü Æ÷Å丮¼Ò±×·¡ÇÇ ÀåºñÀÇ Çʿ伺ÀÌ Áõ°¡Çϰí ÀÖ½À´Ï´Ù. ¶ÇÇÑ, ½º¸¶Æ®Æù, ÅÂºí¸´, »ç¹°ÀÎÅͳÝ(IoT) ±â±â, Â÷·®¿ë ÀüÀÚ±â±â µî ÀüÀÚ±â±âÀÇ »ç¿ëÀÌ Áõ°¡ÇÔ¿¡ µû¶ó ÀÌµé ±â±â¿¡ »ç¿ëµÇ´Â ÁýÀûȸ·Î(IC) Á¦Á¶¿¡ Áß¿äÇÑ ¿ªÇÒÀ» ÇÏ´Â Æ÷Å丮¼Ò±×·¡ÇÇ Àåºñ¿¡ ´ëÇÑ ¼ö¿äµµ Áõ°¡Çϰí ÀÖ½À´Ï´Ù.

5G, ÀΰøÁö´É(AI), ÀÚÀ²ÁÖÇàÂ÷ µî ½Å±â¼úÀÇ °³¹ß°ú »ó¿ëÈ­¸¦ À§Çؼ­´Â Ư¼ö ¹ÝµµÃ¼ ¼ÒÀÚ°¡ ÇÊ¿äÇÕ´Ï´Ù. ÀÌ·¯ÇÑ °³¹ß ¹× »ó¿ëÈ­¸¦ À§Çؼ­´Â ÀÌ·¯ÇÑ Ã·´Ü ºÎǰÀ» Á¦Á¶Çϱâ À§ÇÑ Æ÷Å丮¼Ò±×·¡ÇÇ Àåºñ°¡ ÇÊ¿äÇÕ´Ï´Ù. ÀÌ¿¡ µû¶ó Æ÷Å丮¼Ò±×·¡ÇÇ ÀåºñÀÇ Ã¤ÅÃÀÌ Áõ°¡Çϰí ÀÖÀ¸¸ç, ÇâÈÄ ¸î ³â µ¿¾È ½ÃÀå ¼ö¿ä¸¦ °ßÀÎÇÒ °ÍÀ¸·Î ¿¹»óµË´Ï´Ù.

Á¤ºÎ¿Í ¾÷°è ´Üü´Â ¹ÝµµÃ¼ Á¦Á¶¸¦ ÃËÁøÇϱâ À§ÇØ ¿¬±¸°³¹ß°ú Á¦Á¶ ÀÎÇÁ¶ó¿¡ ÅõÀÚÇÏ´Â °æ¿ì°¡ ¸¹½À´Ï´Ù. ÀÌ·¯ÇÑ ³ë·ÂÀº ½ÃÀåÀ» ÃËÁøÇÒ ¼ö ÀÖ´Â ÀáÀç·ÂÀ» °¡Áö°í ÀÖ½À´Ï´Ù. ¶ÇÇÑ, ¼ÒºñÀÚ ÀüÀÚÁ¦Ç°ÀÇ ²÷ÀÓ¾ø´Â Çõ½Å°ú ¾÷±×·¹À̵å´Â ¹ÝµµÃ¼ Á¦Á¶¾÷üµéÀÌ OLED µð½ºÇ÷¹ÀÌ¿Í °°Àº ÃÖ÷´Ü Æ÷Å丮¼Ò±×·¡ÇÇ Àåºñ Á¦Ç°¿¡ ÅõÀÚÇÏ´Â ¿øµ¿·ÂÀÌ µÇ°í ÀÖÀ¸¸ç, °í¼º´É ÇÁ·Î¼¼¼­´Â ÀÌ·¯ÇÑ ¸Æ¶ô¿¡¼­ ¸Å¿ì Áß¿äÇÕ´Ï´Ù. ÀÌ·¯ÇÑ Ã·´Ü ¹ÝµµÃ¼ Á¦Ç° °³¹ß¿¡ ´ëÇÑ ±â¼ú Çõ½Å°ú ÅõÀÚ Áõ°¡´Â ¿¹Ãø ±â°£ µ¿¾È ½ÃÀå ¼ºÀåÀ» ÃËÁøÇÒ °ÍÀ¸·Î ¿¹»óµË´Ï´Ù.

2022³â ½ÃÀåÀÇ °æÀï ±¸µµ´Â ÁÖ¿ä ¾÷°è ¸®´õµéÀÇ Á¸Àç¿Í ¿µÇâ·ÂÀÌ µÎµå·¯Áö´Âµ¥, ASML, Shanghai Nikon Precision Machinery Co. Veeco Instruments Inc., Conax Technologies, TSMC¸¦ Æ÷ÇÔÇÑ ÀÌµé ¸®´õµéÀº °­·ÂÇÑ ½ÃÀå ÁöÀ§¸¦ ¹Ý¿µÇÏ¿© »ó´çÇÑ ½ÃÀå Á¡À¯À²À» Â÷ÁöÇϰí ÀÖ½À´Ï´Ù. ´Ù¾çÇÑ »ê¾÷ÀÇ ¼ö¿ä Áõ°¡¿¡ ´ëÀÀÇϱâ À§ÇØ ±â¾÷µéÀº M&A, Á¦Á¶ ½Ã¼³ ½Å¼³, Áö¸®Àû È®Àå °èȹ µîÀÇ Àü·«À» ÅëÇØ »ç¾÷ ¼ºÀåÀ» Ãß±¸Çϰí ÀÖ½À´Ï´Ù. ¿¹¸¦ µé¾î, ASML Holding NV´Â 2022³â Çõ½ÅÀûÀÎ ¸ÖƼºö ¿þÀÌÆÛ °Ë»ç ½Ã½ºÅÛÀÎ HMI eScan 1100À» Ãâ½ÃÇϸç Áß¿äÇÑ ÀÌÁ¤Ç¥¸¦ ¼¼¿ü½À´Ï´Ù. ÀÌ ÃÖ÷´Ü ±â¼úÀº ÀÌ·¯ÇÑ ½Ã½ºÅÛ Áß ÃÖÃÊ·Î Ãâ½ÃµÇ´Â °ÍÀ¸·Î, Àü¾Ð ´ëºñ °áÇÔ °Ë»ç ¹× ¹°¸®Àû °áÇÔ °Ë»ç¿Í °°Àº ÀÛ¾÷À» Æ÷ÇÔÇÏ¿© ¼º´É Çâ»ó¿¡ ÃÊÁ¡À» ¸ÂÃá ÀζóÀÎ ¾ÖÇø®ÄÉÀ̼ǿ¡ ¸Â°Ô Á¶Á¤µÇ¾ú½À´Ï´Ù.

Æ÷Å丮¼Ò±×·¡ÇÇ Àåºñ ½ÃÀå º¸°í¼­ ÇÏÀ̶óÀÌÆ®

  • °øÁ¤º°·Î´Â Àڿܼ±(UV) °øÁ¤ ºÎ¹®ÀÌ 2022³â 46.5%ÀÇ ¸ÅÃâ Á¡À¯À²À» Â÷ÁöÇßÀ¸¸ç, UV Æ÷Å丮¼Ò±×·¡ÇǴ ƯÁ¤ ¹ÝµµÃ¼ Á¦Á¶ °øÁ¤, ƯÈ÷ ±¸Çü ³ëµå¿¡¼­ ºñ¿ë È¿À²¼ºÀÌ ³ôÀº °æ¿ì°¡ ¸¹À¸¸ç, EUV ¸®¼Ò±×·¡ÇÇ Àåºñ¿Í Àç·á°¡ °í°¡À̱⠶§¹®¿¡ UV ¸®¼Ò±×·¡ÇÇ´Â ºñ¿ë¿¡ ¹Î°¨ÇÑ Á¦Á¶¾÷ü¿¡°Ô ¸Å·ÂÀûÀÎ ¼±ÅÃÀÌ µÉ ¼ö ÀÖ½À´Ï´Ù.
  • ±¤¿øÀ» ±âÁØÀ¸·Î ¼öÀº ·¥ÇÁ ºÎ¹®Àº 2022³â 29.4%ÀÇ ¸ÅÃâ Á¡À¯À²À» Â÷ÁöÇß½À´Ï´Ù. Æ÷Åä ¸®¼Ò±×·¡ÇÇ Àåºñ¿¡¼­ ¼öÀº ·¥ÇÁ´Â ±¤ÇÐ ½Ã½ºÅÛ¿¡ ³»ÀåµÇ¾î ÀÖ½À´Ï´Ù. ¼öÀº ·¥ÇÁ´Â Æ÷Å丶½ºÅ©¸¦ Åë°úÇÏ¿© Æ÷Åä·¹Áö½ºÆ®°¡ µµÆ÷µÈ ½Ç¸®ÄÜ ¿þÀÌÆÛ¿¡ Áý±¤µÈ ºûÀ» °ø±ÞÇÕ´Ï´Ù.
  • ÆÄÀ庰·Î´Â 70nm-1nm ÆÄÀå ºÎ¹®ÀÌ 2022³â 15.2%ÀÇ ¸ÅÃâ Á¡À¯À²À» Â÷ÁöÇß½À´Ï´Ù. ÀÌ Æ¯Á¤ ÆÄÀåÀº ³×°ÅƼºê AND ·ÎÁ÷ °ÔÀÌÆ®, NAND ·ÎÁ÷ °ÔÀÌÆ®, µ¿Àû ·£´ý ¾×¼¼½º ¸Þ¸ð¸®(DRAM) Á¦Á¶¿¡ ±¤¹üÀ§ÇÏ°Ô Àû¿ëµÇ°í ÀÖ½À´Ï´Ù. ÀÌ ÆÄÀåÀº ¹ÝµµÃ¼ Á¦Á¶¾÷ü°¡ Á¦Á¶ ºñ¿ëÀ» ³·Ãß°í È¿À²ÀûÀ¸·Î ¸Þ¸ð¸® ĨÀ» »ý»êÇÒ ¼ö ÀÖ°Ô ÇØÁÝ´Ï´Ù.
  • ÃÖÁ¾»ç¿ëÀÚ ±âÁØ, ÁýÀû ÀåÄ¡ Á¦Á¶¾÷ü(IDM) ºÎ¹®Àº 2022³â 56.8%ÀÇ ¸ÅÃâ Á¡À¯À²À» Â÷ÁöÇßÀ¸¸ç, IDM ÃÖÁ¾ ¿ëµµÀÇ ÁÖ¿ä ÃßÁø ¿äÀÎÀº ¹ÝµµÃ¼ Á¦Á¶ÀÇ ±â¼ú ¹ßÀü°ú ²÷ÀÓ¾ø´Â Çõ½Å Ãß±¸ÀÔ´Ï´Ù.
  • ij³íÀº ÃÖ±Ù 2023³â 3¿ù¿¡ Àü °øÁ¤¿ë i-¶óÀÎ ½ºÅ×ÆÛ ¹ÝµµÃ¼ ³ë±¤±â FPA-5550iX¸¦ Ãâ½ÃÇÒ ¿¹Á¤À̶ó°í ¹àÇû½À´Ï´Ù. ÀÌ ÃÖ÷´Ü Àåºñ´Â 50 x 50 mmÀÇ ±¤´ëÇÑ ³ë±¤ Çʵ带 °®Ãß°í 0.5 Æò¹æ ¸¶ÀÌÅ©·Î¹ÌÅÍÀÇ ³î¶ó¿î °íÇØ»óµµ¸¦ Á¦°øÇÕ´Ï´Ù.

¸ñÂ÷

Á¦1Àå Á¶»ç ¹æ¹ý°ú ¹üÀ§

Á¦2Àå ÁÖ¿ä ¿ä¾à

Á¦3Àå Æ÷Å丮¼Ò±×·¡ÇÇ Àåºñ ½ÃÀå º¯¼ö, µ¿Çâ, ¹üÀ§

  • ½ÃÀå °èÅë Àü¸Á
  • ½ÃÀå ¼¼ºÐÈ­¿Í ¹üÀ§
  • º¸±Þ°ú ¼ºÀå Àü¸Á ¸ÅÇÎ
  • ¾÷°èÀÇ ¹ë·ùüÀÎ ºÐ¼®
  • º¥´õ ¸ÅÆ®¸¯½º
  • ±ÔÁ¦ ü°è
  • Æ÷Å丮¼Ò±×·¡ÇÇ Àåºñ ½ÃÀå - ½ÃÀå ¿ªÇÐ
    • ½ÃÀå ¼ºÀå ÃËÁø¿äÀÎ ºÐ¼®
    • ½ÃÀå ¼ºÀå ¾ïÁ¦¿äÀÎ ºÐ¼®
    • ½ÃÀå ±âȸ ºÐ¼®
    • ½ÃÀå °úÁ¦ ºÐ¼®
  • ¾÷°è ºÐ¼® Åø : Æ÷Å丮¼Ò±×·¡ÇÇ Àåºñ ½ÃÀå
    • Porters ºÐ¼®
    • °Å½Ã°æÁ¦ ºÐ¼®
  • °æÁ¦ ¸Þ°¡Æ®·»µå ºÐ¼®

Á¦4Àå Æ÷Å丮¼Ò±×·¡ÇÇ Àåºñ ½ÃÀå : ÇÁ·Î¼¼½º ÃßÁ¤¡¤µ¿Ç⠺м®

  • ÇÁ·Î¼¼½º º¯µ¿ ºÐ¼®°ú ½ÃÀå Á¡À¯À², 2022³â°ú 2030³â
  • Àڿܼ± UV
  • ½ÉÀڿܼ±(DUV)
  • ±ØÀڿܼ±(EUV)
  • ±âŸ

Á¦5Àå Æ÷Å丮¼Ò±×·¡ÇÇ Àåºñ ½ÃÀå : ±¤¿ø ÃßÁ¤¡¤µ¿Ç⠺м®

  • ±¤¿ø º¯µ¿ ºÐ¼®°ú ½ÃÀå Á¡À¯À², 2022³â°ú 2030³â
  • ¼öÀº ·¥ÇÁ
  • ºÒ¼Ò ·¹ÀÌÀú
  • ¿¢½Ã¸Ó ·¹ÀÌÀú
  • ±âŸ

Á¦6Àå Æ÷Å丮¼Ò±×·¡ÇÇ Àåºñ ½ÃÀå : ÆÄÀå ÃßÁ¤¡¤µ¿Ç⠺м®

  • ÆÄÀå º¯µ¿ º¯µ¿ ºÐ¼®°ú ½ÃÀå Á¡À¯À², 2022³â°ú 2030³â
  • 370nm-270nm
  • 270nm-170nm
  • 70nm-1nm

Á¦7Àå Æ÷Å丮¼Ò±×·¡ÇÇ Àåºñ ½ÃÀå : ÃÖÁ¾»ç¿ëÀÚ ÃßÁ¤¡¤µ¿Ç⠺м®

  • ÃÖÁ¾»ç¿ëÀÚ º¯µ¿ ºÐ¼®°ú ½ÃÀå Á¡À¯À², 2022³â°ú 2030³â
  • ÅëÇÕ µð¹ÙÀ̽º Á¦Á¶¾÷ü(IDM)
  • ÁÖ¹° °øÀå

Á¦8Àå Æ÷Å丮¼Ò±×·¡ÇÇ Àåºñ ½ÃÀå : Áö¿ª ÃßÁ¤¡¤µ¿Ç⠺м®

  • Áö¿ª º¯µ¿ ºÐ¼®°ú ½ÃÀå Á¡À¯À², 2022³â°ú 2030³â
  • ºÏ¹Ì
    • ½ÃÀå ÃßÁ¤°ú ¿¹Ãø, 2018-2030³â
    • ¹Ì±¹
    • ij³ª´Ù
    • ¸ß½ÃÄÚ
  • À¯·´
    • ½ÃÀå ÃßÁ¤°ú ¿¹Ãø, 2018-2030³â
    • µ¶ÀÏ
    • ¿µ±¹
    • ÇÁ¶û½º
    • ½ºÆäÀÎ
    • ³×´ú¶õµå
    • ÀÌÅ»¸®¾Æ
  • ¾Æ½Ã¾ÆÅÂÆò¾ç
    • ½ÃÀå ÃßÁ¤°ú ¿¹Ãø, 2018-2030³â
    • Áß±¹
    • ÀϺ»
    • Àεµ
    • Çѱ¹
    • ´ë¸¸
  • ¶óƾ¾Æ¸Þ¸®Ä«
    • ½ÃÀå ÃßÁ¤°ú ¿¹Ãø, 2018-2030³â
    • ºê¶óÁú
  • Áßµ¿ ¹× ¾ÆÇÁ¸®Ä«
    • ½ÃÀå ÃßÁ¤°ú ¿¹Ãø, 2018-2030³â
    • À̽º¶ó¿¤
    • ³²¾ÆÇÁ¸®Ä«°øÈ­±¹

Á¦9Àå Æ÷Å丮¼Ò±×·¡ÇÇ Àåºñ ½ÃÀå - °æÀï ºÐ¼®

  • ÁÖ¿ä ½ÃÀå ÁøÃâ ±â¾÷¿¡ ÀÇÇÑ ÃÖ±ÙÀÇ µ¿Çâ°ú ¿µÇ⠺м®
  • ÁÖ¿ä ±â¾÷/°æÀï ºÐ·ù
  • ÁøÃâ ±â¾÷ °³¿ä
  • À繫 °³¿ä
  • Á¦Ç° º¥Ä¡¸¶Å©
  • ±â¾÷ ½ÃÀå¿¡¼­ÀÇ Æ÷Áö¼Å´×
  • °æÀï ´ë½Ãº¸µå ºÐ¼®
  • ±â¾÷ÀÇ ½ÃÀå Á¡À¯À² ºÐ¼®, 2022³â
  • ±â¾÷ È÷Æ®¸Ê ºÐ¼®
  • Àü·« ¸ÅÇÎ
    • È®Àå
    • ÀμöÇÕº´
    • ÆÄÆ®³Ê½Ê/Çù¾÷
    • Á¦Ç° ¹ß¸Å

Á¦10Àå ±â¾÷ °³¿ä

  • ASML
  • Shanghai Nikon Precision Machinery Co., Ltd.
  • Canon Optical Equipment(Shanghai) Co., Ltd.
  • Veeco Instruments Inc.,
  • Conax Technologies
  • TSMC
  • Nikon Corporation
  • SUSS Microtec SE
  • Holmarc Opto-Mechatronics(P) Ltd
  • KLA Corporation
ksm 23.11.17

Photolithography Equipment Market Growth & Trends:

The global photolithography equipment market size is anticipated to reach USD 18.21 billion by 2030, according to a new report by Grand View Research, Inc.. The market is projected to grow at a CAGR of 6.4% from 2023 to 2030. The ongoing demand for smaller, more powerful, and energy-efficient semiconductor devices drives the need for advanced photolithography equipment. As semiconductor technology evolves, manufacturers require equipment capable of producing smaller feature sizes and higher resolution.

The expansion of cloud computing and data centers leads to an increased demand for high-performance processors and memory chips. This, in turn, drives the need for advanced photolithography equipment to produce the required semiconductors. In addition, the growing use of electronic devices such as smartphones, tablets, IoT devices, and automotive electronics fuels the demand for photolithography equipment as it plays a key role in producing the integrated circuits (ICs) used in these devices.

The development and commercialization of emerging technologies like 5G, artificial intelligence (AI), and autonomous vehicles require specialized semiconductor devices. This development and commercialization necessitates the need for photolithography equipment for manufacturing these advanced components. Thus, the growing adoption of photolithography equipment is anticipated to boost the market demand in the coming years.

Governments and industry organizations often invest in research and development, as well as manufacturing infrastructure, to promote semiconductor manufacturing within their regions. These initiatives can boost the market. Moreover, the constant innovation and upgrades in consumer electronics drive semiconductor manufacturers to invest in cutting-edge photolithography equipment products like OLED displays, and high-performance processors are crucial in this context. Such increasing innovation and investment in the development of advanced semiconductor products is anticipated to fuel the market growth over the forecast period.

The competitive landscape of the market in 2022 was marked by the presence of key industry leaders along with their significant influence. These leaders, including ASML, Shanghai Nikon Precision Machinery Co., Ltd., Canon Optical Equipment (Shanghai) Co., Ltd., Veeco Instruments Inc., Conax Technologies, and TSMC, held substantial market shares, reflecting their strong market positions. To meet the rising demand from diverse industries, corporations are pursuing business growth through strategies such as mergers and acquisitions, the establishment of new manufacturing facilities, and geographic expansion initiatives. For instance, in 2022, ASML Holding NV achieved a significant milestone by launching the HMI eScan 1100, a revolutionary multibeam wafer inspection system. This cutting-edge technology represents the first-ever deployment of such a system and is tailored for in-line applications with a focus on enhancing performance, including tasks like voltage contrast defect inspection and physical defect inspection.

Photolithography Equipment Market Report Highlights:

  • In terms of process, the ultraviolet (UV) process segment held a revenue share of 46.5% in 2022. UV photolithography is often more cost-effective for certain semiconductor manufacturing processes, especially for older nodes. EUV lithography equipment and materials can be expensive, making UV lithography an attractive option for cost-conscious manufacturers
  • Based on the light source, the mercury lamp segment held a revenue share of 29.4% in 2022. In photolithography equipment, mercury lamps are integrated into the optical system. They provide the light that passes through a photomask and is then focused onto a silicon wafer coated with photoresist
  • In terms of wave length, the 70 nm-1 nm wave length segment held a revenue share of 15.2% in 2022. This particular wavelength finds extensive application in the production of negative AND and NAND logic gates, as well as dynamic random access memory (DRAM). It empowers semiconductor manufacturers to efficiently create memory chips at a reduced manufacturing cost
  • Based on end-users, the Integrated Device Manufacturer (IDMs) segment held a revenue share of 56.8% in 2022. The primary driving factor for the IDMs end-use is the relentless pursuit of technological advancement and innovation in semiconductor manufacturing
  • In a recent announcement from Canon Inc., it was disclosed that they will be launching the FPA-5550iX i-line stepper semiconductor lithography equipment for front-end processes in March 2023. This state-of-the-art equipment features a substantial exposure field measuring 50 x 50 mm and delivers an impressive high resolution of 0.5 square micrometers

Table of Contents

Chapter 1. Methodology and Scope

  • 1.1. Research Methodology
  • 1.2. Research Scope & Assumption
  • 1.3. Information Procurement
    • 1.3.1. Purchased Database
    • 1.3.2. GVR's Internal Database
    • 1.3.3. Secondary Sources & Third-Party Perspectives
    • 1.3.4. Primary Research
  • 1.4. Information Analysis
    • 1.4.1. Data Analysis Models
  • 1.5. Market Formulation & Data Visualization
  • 1.6. Data Validation & Publishing

Chapter 2. Executive Summary

  • 2.1. Market Outlook
  • 2.2. Segmental Outlook
  • 2.3. Competitive Insights

Chapter 3. Photolithography Equipment Market Variables, Trends & Scope

  • 3.1. Market Lineage Outlook
  • 3.2. Market Segmentation & Scope
  • 3.3. Penetration & Growth Prospect Mapping
  • 3.4. Industry Value Chain Analysis
  • 3.5. Vendor Matrix
  • 3.6. Regulatory Framework
  • 3.7. Photolithography Equipment Market - Market dynamics
    • 3.7.1. Market Driver Analysis
    • 3.7.2. Market Restraint Analysis
    • 3.7.3. Market Opportunity Analysis
    • 3.7.4. Market Challenges Analysis
  • 3.8. Industry Analysis Tools: Photolithography Equipment Market
    • 3.8.1. Porter's Analysis
    • 3.8.2. Macroeconomic Analysis
  • 3.9. Economic Mega Trend Analysis

Chapter 4. Photolithography Equipment Market: Process Estimates & Trend Analysis

  • 4.1. Process Movement Analysis & Market Share, 2022 & 2030
    • 4.1.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
  • 4.2. Ultraviolet UV
    • 4.2.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
  • 4.3. Deep Ultraviolet (DUV)
    • 4.3.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
  • 4.4. Extreme Ultraviolet (EUV)
    • 4.4.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
  • 4.5. Others
    • 4.5.1. Market estimates and forecasts, 2018 - 2030 (USD Million)

Chapter 5. Photolithography Equipment Market: Light Source Estimates & Trend Analysis

  • 5.1. Light Source Movement Analysis & Market Share, 2022 & 2030
    • 5.1.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
  • 5.2. Mercury Lamp
    • 5.2.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
  • 5.3. Fluorine Laser
    • 5.3.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
  • 5.4. Excimer Laser
    • 5.4.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
  • 5.5. Others
    • 5.5.1. Market estimates and forecasts, 2018 - 2030 (USD Million)

Chapter 6. Photolithography Equipment Market: Wave Length Estimates & Trend Analysis

  • 6.1. Wave Length Movement Analysis & Market Share, 2022 & 2030
    • 6.1.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
  • 6.2. 370nm -270nm
    • 6.2.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
  • 6.3. 270nm - 170nm
    • 6.3.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
  • 6.4. 70nm - 1nm
    • 6.4.1. Market estimates and forecasts, 2018 - 2030 (USD Million)

Chapter 7. Photolithography Equipment Market: End-users Estimates & Trend Analysis

  • 7.1. End-users Movement Analysis & Market Share, 2022 & 2030
    • 7.1.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
  • 7.2. Integrated Device Manufacturers (IDMs)
    • 7.2.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
  • 7.3. Foundries
    • 7.3.1. Market estimates and forecasts, 2018 - 2030 (USD Million)

Chapter 8. Photolithography Equipment Market: Regional Estimates & Trend Analysis

  • 8.1. Regional Movement Analysis & Market Share, 2022 & 2030
  • 8.2. North America
    • 8.2.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
    • 8.2.2. U.S.
      • 8.2.2.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
    • 8.2.3. Canada
      • 8.2.3.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
    • 8.2.4. Mexico
      • 8.2.4.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
  • 8.3. Europe
    • 8.3.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
    • 8.3.2. Germany
      • 8.3.2.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
    • 8.3.3. UK
      • 8.3.3.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
    • 8.3.4. France
      • 8.3.4.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
    • 8.3.5. Spain
      • 8.3.5.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
    • 8.3.6. Netherlands
      • 8.3.6.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
    • 8.3.7. Italy
      • 8.3.7.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
  • 8.4. Asia Pacific
    • 8.4.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
    • 8.4.2. China
      • 8.4.2.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
    • 8.4.3. Japan
      • 8.4.3.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
    • 8.4.4. India
      • 8.4.4.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
    • 8.4.5. South Korea
      • 8.4.5.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
    • 8.4.6. Taiwan
      • 8.4.6.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
  • 8.5. Latin America
    • 8.5.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
    • 8.5.2. Brazil
      • 8.5.2.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
  • 8.6. Middle East & Africa
    • 8.6.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
    • 8.6.2. Israel
      • 8.6.2.1. Market estimates and forecasts, 2018 - 2030 (USD Million)
    • 8.6.3. South Africa
      • 8.6.3.1. Market estimates and forecasts, 2018 - 2030 (USD Million)

Chapter 9. Photolithography Equipment Market - Competitive Analysis

  • 9.1. Recent Developments & Impact Analysis, By Key Market Participants
  • 9.2. Key Company/Competition Categorization
  • 9.3. Participant's Overview
  • 9.4. Financial Overview
  • 9.5. Product Benchmarking
  • 9.6. Company Market Positioning
  • 9.7. Competitive Dashboard Analysis
  • 9.8. Company Market Share Analysis, 2022
  • 9.9. Company Heat Map Analysis
  • 9.10. Strategy Mapping
    • 9.10.1. Expansions
    • 9.10.2. Mergers & acquisitions
    • 9.10.3. Partnerships/collaborations
    • 9.10.4. Product launches

Chapter 10. Company Profiles

  • 10.1. ASML
  • 10.2. Shanghai Nikon Precision Machinery Co., Ltd.
  • 10.3. Canon Optical Equipment (Shanghai) Co., Ltd.
  • 10.4. Veeco Instruments Inc.,
  • 10.5. Conax Technologies
  • 10.6. TSMC
  • 10.7. Nikon Corporation
  • 10.8. SUSS Microtec SE
  • 10.9. Holmarc Opto-Mechatronics (P) Ltd
  • 10.10. KLA Corporation
ºñ±³¸®½ºÆ®
0 °ÇÀÇ »óǰÀ» ¼±Åà Áß
»óǰ ºñ±³Çϱâ
Àüü»èÁ¦