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CVD Àåºñ ½ÃÀå º¸°í¼ : ±â¼úº°, ¿ëµµº°, ÃÖÁ¾»ç¿ëÀÚº°, Áö¿ªº°(2025-2033³â)Chemical Vapour Deposition Equipment Market Report by Technology (Plasma Enhanced CVD, Low Pressure CVD, Metal Organic CVD, Atmospheric Pressure CVD, and Others), Application, End User, and Region 2025-2033 |
¼¼°è CVD Àåºñ ½ÃÀå ±Ô¸ð´Â 2024³â 327¾ï ´Þ·¯¿¡ ´ÞÇß½À´Ï´Ù. ÇâÈÄ IMARC GroupÀº 2033³â±îÁö 613¾ï ´Þ·¯¿¡ ´ÞÇÒ °ÍÀ¸·Î ¿¹»óÇϸç, 2025-2033³â ¿¬Æò±Õ ¼ºÀå·ü(CAGR)Àº 6.88%¿¡ ´ÞÇÒ °ÍÀ¸·Î Àü¸ÁÇϰí ÀÖ½À´Ï´Ù. ÀüÀÚ »ê¾÷ÀÇ °ý¸ñÇÒ¸¸ÇÑ ¼ºÀå, ÀÇ·á¿ë CVD Àåºñ¿¡ ´ëÇÑ ¼ö¿ä Áõ°¡, ±¤¹üÀ§ÇÑ ¿¬±¸ °³¹ß(R&D) Ȱµ¿ÀÌ ½ÃÀåÀ» ÁÖµµÇÏ´Â ÁÖ¿ä ¿äÀÎÀÔ´Ï´Ù.
CVD Àåºñ´Â ±âü »óÅÂÀÇ ½Ã¾à°ú ¿¿¡ ÀÇÇÑ ÈÇÐ ¹ÝÀÀÀ» ÀÌ¿ëÇÏ¿© ´Ù¾çÇÑ Àç·áÀÇ ¹Ú¸·À» ±âÆÇ¿¡ ÁõÂøÇÏ´Â µ¥ »ç¿ëµË´Ï´Ù. Àåºñ´Â ÀϹÝÀûÀ¸·Î ¹ÝÀÀ½Ç, °¡½º °ø±Þ ½Ã½ºÅÛ, ¿¡³ÊÁö ¿ø, Áø°ø ½Ã½ºÅÛ, °¡¿ ½Ã½ºÅÛ, ¹è±â ½Ã½ºÅÛÀ¸·Î ±¸¼ºµÇ¸ç, CVD Àåºñ´Â žçÀüÁöÆÇ, ¹ß±¤ ´ÙÀÌ¿Àµå, ÁýÀû ȸ·Î(IC) Á¦Á¶¿¡ »ç¿ëµÇ´Â Àç·á¸¦ ¸¸µé±â À§ÇØ ÄÚÆÃ ¹× ¹ÝµµÃ¼ »ê¾÷¿¡¼ ³Î¸® »ç¿ëµÇ°í ÀÖ½À´Ï´Ù. ÀÌ Àåºñ´Â ¸· ¼øµµ, ¸· µÎ²², Á¶¼º, ¹Ì¼¼ ±¸Á¶ÀÇ Á¦¾î°¡ ¿ì¼öÇÑ °íǰÁúÀÇ ±ÕÀÏÇÑ ¸·À» »ý»êÇϸç, CVD Àåºñ´Â ´Ù¿ëµµ¼º, Àú¿Â ÁõÂø, ³ôÀº »ý»ê ¼Óµµ, ³·Àº Æó±â¹° ¹ß»ýÀ» ³ªÅ¸³»´Â °·ÂÇÑ µµ±¸ÀÔ´Ï´Ù. ±× °á°ú, ÀüÀÚ, ÄÚÆÃ, Ã˸Š»ê¾÷ µî ´Ù¾çÇÑ ºÐ¾ß¿¡¼ »ç¿ëµÇ°í ÀÖ½À´Ï´Ù.
CVD Àåºñ´Â È®»ê À庮, °í¿ Àüµµ¼º ±âÆÇ(¹æ¿ÆÇ)°ú °°Àº °ü·Ã ±¸Á¶»Ó¸¸ ¾Æ´Ï¶ó °í±Þ ÀüÀÚ µµÃ¼ ¹× Àý¿¬Ã¼ÀÇ ¼³°è ¹× °¡°ø»Ó¸¸ ¾Æ´Ï¶ó È®»ê À庮 ¹× °í¿ Àüµµ¼º ±âÆÇ(¹æ¿ÆÇ)°ú °°Àº °ü·Ã ±¸Á¶¹°¿¡µµ ³Î¸® »ç¿ëµÇ°í ÀÖ½À´Ï´Ù. ÀÌ¿¡ µû¶ó ¸¶ÀÌÅ©·ÎĨ, Æ®·£Áö½ºÅÍ, ¼¾¼ µî ¸¶ÀÌÅ©·Î ÀüÀÚºÎǰ¿¡ ´ëÇÑ ¼ö¿ä°¡ Áõ°¡ÇÏ¸é¼ ½ÃÀå ¼ºÀåÀ» °ßÀÎÇϰí ÀÖ½À´Ï´Ù. ¶ÇÇÑ, ÆòÆÇ µð½ºÇ÷¹ÀÌ, ³ëÆ®ºÏ, ÀúÀå ÀåÄ¡, ÈÞ´ë ÀüÈ ¹× ±âŸ ÀüÀÚ±â±â »ý»ê¿¡ ´ëÇÑ CVD ÀåºñÀÇ ¼ö¿ä Áõ°¡µµ ¼ºÀåÀ» ÃËÁøÇÏ´Â ¿äÀÎÀ¸·Î ÀÛ¿ëÇϰí ÀÖ½À´Ï´Ù. À̿ʹ º°µµ·Î, ´õ ³·Àº ±âÆÇ ¿Âµµ¿¡¼ Àç·á¸¦ ÁõÂøÇÏ´Â ÇöóÁ °È CVD(PECVD) ±â¼úÀÇ µµÀÔÀº ±âÆÇ¿¡ °¡ÇØÁö´Â ¿ ÀÀ·ÂÀ» °¨¼Ò½ÃÄÑ ¿Âµµ¿¡ ¹Î°¨ÇÑ Àç·á¸¦ »ç¿ëÇÒ ¼ö ÀÖµµ·Ï µµ¿ÍÁÝ´Ï´Ù. ¶ÇÇÑ, °áÁ¤Áú ½Ç¸®ÄÜ Å¾çÀüÁöÀÇ °áÁ¤Áú ½Ç¸®ÄÜ ÁõÂø¿¡¼ ¹Ú¸· °í¼º´É Çʸ§ žçÀüÁöÀÇ ´Ù¾çÇÑ Àç·á ÁõÂø¿¡ À̸£±â±îÁö žçÀüÁö Á¦Á¶ÀÇ ±¤¹üÀ§ÇÑ ÀÀ¿ë ºÐ¾ß¿¡ Àåºñ°¡ ³Î¸® »ç¿ëµÇ°í ÀÖ´Â °Íµµ ½ÃÀå ¼ºÀåÀ» ÃËÁøÇϰí ÀÖ½À´Ï´Ù. ¶ÇÇÑ, ¸ÖƼ è¹öÇü CVD ÀåºñÀÇ Ãâ½Ã·Î ÇÑ °øÁ¤¿¡¼ ¿©·¯ Àç·áÀÇ ÁõÂøÀÌ °¡´ÉÇØÁ® È¿À² Çâ»ó°ú Á¦Á¶ ½Ã°£ ´ÜÃà¿¡ ±â¿©Çϰí ÀÖ½À´Ï´Ù. ±âŸ ¿äÀÎÀ¸·Î´Â ÀÇ·á¿ë CVD Àåºñ¿¡ ´ëÇÑ ¼ö¿ä Áõ°¡, ±¤¹üÀ§ÇÑ ¿¬±¸°³¹ß(R&D) Ȱµ¿, ´Ù¾çÇÑ »ê¾÷ ºÐ¾ßÀÇ ÄÚÆÃ ¼ö¿ä Áõ°¡, ±¹³» Á¦Á¶¸¦ Àå·ÁÇÏ´Â ´Ù¾çÇÑ Á¤ºÎ ÀÌ´Ï¼ÅÆ¼ºê ½ÃÇà µîÀÌ ½ÃÀå ¼ºÀåÀ» ÃËÁøÇÒ °ÍÀ¸·Î ¿¹»óµË´Ï´Ù.
The global chemical vapour deposition (CVD) equipment market size reached USD 32.7 Billion in 2024. Looking forward, IMARC Group expects the market to reach USD 61.3 Billion by 2033, exhibiting a growth rate (CAGR) of 6.88% during 2025-2033. Significant growth in the electronics industry, the increasing demand for CVD equipment in medical applications, and extensive research and development (R&D) activities represent some of the key factors driving the market.
A chemical vapor deposition (CVD) system is used to deposit thin films of various materials onto a substrate using gaseous reagents and thermally induced chemical reactions. The equipment typically consists of a reaction chamber, gas delivery system, energy source, vacuum system, heating system, and exhaust system. CVD equipment is widely used in the coatings and semiconductor industry to make materials that are used to produce solar panels, light-emitting diodes, and integrated circuits (ICs). The equipment produces high-quality, uniform films with excellent film purity, thickness, composition, and microstructure control. CVD equipment is a powerful tool that exhibits versatility, low-temperature deposition, high production rates, and low waste generation. As a result, it finds extensive applications across the electronics, coatings, and catalysis industries.
The widespread product adoption in the electronics industry across the globe is one of the key factors driving the market growth. CVD equipment is widely used in the designing and processing of advanced electronic conductors and insulators, as well as related structures, such as diffusion barriers and high thermal conductivity substrates (heat sinks). In line with this, the increasing demand for microelectronic components such as microchips, transistors, and sensors are favoring the market growth. Moreover, the rising demand for CVD equipment in the production of flat panel displays, laptops, storage devices, mobile phones, and other electronic items is acting as another growth-inducing factor. Apart from this, the introduction of the plasma-enhanced CVD (PECVD) technique to deposit materials at lower substrate temperatures helps to reduce the thermal stress on the substrate and allows for the use of temperature-sensitive materials, which in turn is providing an impetus to the market growth. Additionally, the widespread equipment utilization for a wide range of applications in solar cell manufacture, such as crystalline silicon deposition in crystalline-silicon solar cells to the deposition of a variety of materials in thin high-performance film solar cells, is propelling the market growth. Furthermore, the launch of multi-chamber CVD equipment, which helps in the deposition of multiple materials in a single process that assists in increasing efficiency and reducing manufacturing time, which in turn is creating a positive outlook for the market. Other factors, including the increasing demand for CVD equipment in medical applications, extensive research and development (R&D) activities, rising demand for coatings in various industries, and the implementation of various government initiatives to encourage domestic manufacturing, are anticipated to drive the market growth.
Kindly note that this only represents a partial list of companies, and the complete list has been provided in the report.