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반도체 공정 냉각 시장 규모, 점유율 및 성장 예측(2026-2032년)

Semiconductor Process Cooling Market Size, Share & Growth Forecast (2026-2032)

발행일: | 리서치사: 구분자 Knowledge Sourcing Intelligence | 페이지 정보: 영문 1584 Pages | 배송안내 : 1-2일 (영업일 기준)

    
    
    



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※ 본 상품은 영문 자료로 한글과 영문 목차에 불일치하는 내용이 있을 경우 영문을 우선합니다. 정확한 검토를 위해 영문 목차를 참고해주시기 바랍니다.

반도체 공정 냉각 시장은 2026년에 29억 달러로 추산되며, 2032년까지 56억 5,000만 달러에 달할 것으로 전망됩니다. 이는 2026년부터 2032년까지 연평균 성장률(CAGR) 11.8%를 나타내는 수치입니다.

반도체 업계에서는 공정 아키텍처의 고도화와 제조 윈도우의 축소로 인해 정밀한 열 제어가 점점 더 중요해지고 있습니다. 에칭, 박막 형성, 리소그래피, 세정, 이온 주입, 화학적 기계적 평탄화(CMP) 및 웨이퍼 테스트 모두 공정 안정성과 장비 신뢰성을 유지하기 위해 온도 제어가 필요합니다. 현대 팹에서는 두 가지 연계된 수준에서 공정 냉각이 이루어지고 있습니다. 시설 수준의 공정 냉각수 시스템은 광범위한 열 부하를 관리하는 반면, 장비 수준의 칠러는 개별 공정 모듈에 대해 보다 정밀한 온도 제어를 제공합니다. 반도체 장비의 복잡성이 증가함에 따라, 더 넓은 온도 범위, 과도적인 열 부하에 대한 신속한 대응, 다중 채널 온도 제어 및 초저온 냉각에 대한 수요가 높아지고 있습니다. 동시에, 에너지 효율 및 냉매 규제의 변화가 장비 설계에 영향을 미치고 있습니다. 팹이 엄격한 열적 안정성을 유지하면서 냉동 에너지를 절감하기 위해 노력함에 따라, 저GWP 냉매, 천연 CO₂ 시스템, 열전 냉각, 열교환기 및 하이브리드 공정 냉각 아키텍처의 중요성이 커지고 있습니다.

시장 촉진요인

첨단 에칭 및 박막 형성 공정

  • 로직 미세화, 게이트 올 어라운드(GAA) 아키텍처, 고층수 NAND 및 첨단 패터닝으로 인해 에칭 및 증착 공정의 수와 복잡성이 증가하고 있습니다. 온도 제어는 반응의 선택성, 측벽 프로파일, 박막 특성 및 공정의 균일성에 영향을 미칠 수 있습니다.
  • 따라서 첨단 공정에서는 더 넓은 온도 범위에서 작동할 수 있는 칠러에 대한 수요가 발생하고 있습니다. 특히, 심층 에칭 공정이나 더 좁은 공정 윈도우가 필요한 용도의 경우, 초저온 시스템의 중요성이 점점 더 커지고 있습니다. 일부 첨단 응용 분야에서는 -50°C 이하의 온도가 필요하기 때문에 공정 냉각 장치의 가치와 기술적 복잡성이 증가하고 있습니다.

동적 열 부하의 증가

  • 현대 반도체 공정 레시피에서는 소비 전력이나 발열량이 급격하게 변화하는 경우가 있습니다. 냉각 장치는 과도한 온도 오버슈트나 장기간의 안정화 기간을 초래하지 않으면서 이러한 변화에 신속하게 대응해야 합니다.
  • 이로 인해 응답성이 뛰어난 칠러와 멀티채널 온도 제어 장치에 대한 수요가 증가하고 있습니다. 단일 공정 장비라 하더라도 챔버 벽, 정전식 척, 광학 시스템, 화학 약품 및 기타 구성요소마다 독립적인 열 루프가 필요할 수 있습니다. 독립적인 온도 구역을 설정함으로써 개별 공정 조건을 보다 정밀하게 관리할 수 있게 됩니다.
  • 따라서 멀티채널 아키텍처의 활용 확대는 고부가가치 냉각 장치에 대한 수요를 촉진하는 동시에, 칠러와 반도체 공정 장치의 제어 시스템 간의 보다 긴밀한 통합을 촉진하고 있습니다.

냉매 규제 및 저 GWP로의 전환

  • 반도체 공정용 칠러는 많은 경우, 기존 산업용 냉동이 대응하는 온도 범위보다 낮은 온도에서 가동됩니다. 기존에는 이러한 용도 중 일부에서 지구온난화지수(GWP)가 비교적 높은 냉매가 사용되어 왔습니다.
  • 냉매 요건의 변화로 인해 GWP가 낮은 대체 냉매의 개발이 가속화되고 있습니다. 각 공급업체는 저GWP 냉매, 천연 CO2 시스템, 열전 냉각과 같은 비냉동 기술을 평가하고 있습니다. 대체 냉매는 온도 범위, 압력, 효율, 안전성 및 재료와의 호환성에 관한 요건을 충족해야 하므로, 이러한 전환은 기술적으로 어려움을 수반합니다.
  • 따라서 시장은 현재 장비 재설계 및 적합성 평가 단계에 접어들었습니다. 반도체 제조업체는 기존 기술을 대체하기 전에 대체 냉각 시스템이 공정의 안정성과 신뢰성을 유지할 수 있는지 확인해야 합니다.

팹의 에너지 효율 요건

  • 공정 냉각은 팹의 에너지 소비에서 큰 비중을 차지합니다. 모든 반도체 공정에서 압축기 방식의 냉각이 지속적으로 필요한 것은 아닙니다. 공정 요구 사항이 허용하는 한, 시설의 공정 냉각수는 냉각탑, 혼합 모드 시스템 또는 중앙 집중식 냉각 인프라를 통해 열을 제거할 수 있습니다.
  • 하이브리드 및 듀얼 냉각 아키텍처를 통해 팹은 조건이 허용하는 한 에너지 소비가 적은 방열 방법을 활용하고, 보다 정밀한 온도 제어가 필요한 부하에는 기계식 냉각을 할당할 수 있습니다. 그 결과, 열교환기 및 공정 냉각수와의 인터페이스의 중요성이 높아지고 있습니다.
  • 또한, 온도 안정성을 저해하지 않으면서 에너지 소비를 줄이기 위해 가변 속도 펌프, 인버터식 압축기, 열전 시스템, 예측 제어 및 열 회수 기술도 활용되고 있습니다.

시장 억제요인

  • 주요 과제는 온도 범위, 냉각 능력, 응답 시간, 에너지 소비량, 신뢰성, 설치 면적 및 냉매의 규제 적합성 간의 균형을 맞추는 것입니다. 극저온 시스템의 경우, 복잡한 다단 냉동 시스템이나 특수한 열전달 유체가 필요할 수 있습니다. GWP(지구 온난화 지수)가 낮은 대체 냉매를 사용하면 압력, 가연성, 재료 적합성 또는 효율 측면에서 제약이 발생할 수 있습니다.
  • 또한, 반도체 제조업체는 장비 가동률을 매우 높게 유지해야 합니다. 냉각 장치는 생산 설비에 직접 연결되어 있으므로, 고장이나 온도 불안정은 제조 공정에 영향을 미칠 수 있습니다. 따라서 새로운 냉매, 냉각 아키텍처 및 열 제어 기술은 널리 도입되기 전에 철저한 검증이 필요합니다.
  • 기존 팹을 개조하는 것은 어려운 경우가 있습니다. 이는 공정 냉각이 시설의 상수도, 전기 인프라, 공정 장비 및 기타 유틸리티 시스템과 통합되어 있기 때문입니다. 생산을 중단하지 않고 냉각 장치를 교체하거나 개조하려면 대규모 엔지니어링 작업이 필요할 수 있습니다.
  • 또한, 에너지 절약에는 상충 관계도 따릅니다. 적극적인 최적화를 수행하더라도 공정 제어 및 반도체 수율에 필요한 온도 안정성을 저해해서는 안 됩니다. 따라서 운영자는 에너지 절약 효과와 열 성능 및 신뢰성을 비교 검토해야 합니다.

목차

제1장 주요 요약

제2장 시장 개요

제3장 시장 규모와 예측(2026-2032년)

제4장 시장 : 냉각 아키텍처별

제5장 시장 : 온도 범위별

제6장 시장 : 반도체 공정별

제7장 시장 : 냉각 매체별

제8장 시장 : 설치 형태별

제9장 지역 시장

제10장 시장 역학

제11장 경쟁 구도

제12장 기업 개요

제13장 최근 동향

제14장 부록

KSM 26.10.21

The Semiconductor Process Cooling Market is estimated at USD 2.90 billion in 2026 and is projected to reach USD 5.65 billion by 2032, representing a CAGR of 11.8% during 2026-2032.

The semiconductor industry is placing greater emphasis on precise thermal control as process architectures become more advanced and manufacturing windows become tighter. Etching, deposition, lithography, cleaning, ion implantation, chemical mechanical planarization, and wafer testing all require controlled temperatures to maintain process stability and equipment reliability. Modern fabs use process cooling at two connected levels. Facility process-cooling-water systems manage broader heat loads, while tool-level chillers provide tighter temperature control for individual process modules. The increasing complexity of semiconductor tools is creating demand for wider temperature ranges, faster response to transient heat loads, multi-channel temperature control, and ultra-low-temperature cooling. At the same time, energy efficiency and refrigerant regulation are changing equipment design. Low-GWP refrigerants, natural CO2 systems, thermoelectric cooling, heat exchangers, and hybrid process-cooling architectures are gaining importance as fabs seek to reduce refrigeration energy while maintaining strict thermal stability.

Market Drivers

Advanced Etch and Deposition Processes

  • Logic scaling, gate-all-around architectures, high-layer-count NAND, and advanced patterning are increasing the number and complexity of etch and deposition steps. Temperature control can influence reaction selectivity, sidewall profiles, film characteristics, and process uniformity.
  • Advanced processes are therefore creating demand for chillers capable of operating across wider temperature ranges. Ultra-low-temperature systems are becoming particularly relevant for deep etch processes and applications requiring tighter process windows. Some advanced applications require temperatures below -50°C, increasing the value and technical complexity of process cooling equipment.

Higher Dynamic Heat Loads

  • Modern semiconductor process recipes can change power consumption and heat generation rapidly. Cooling equipment must respond quickly to these changes without excessive temperature overshoot or prolonged stabilization periods.
  • This is supporting demand for high-response chillers and multi-channel temperature-control units. A single process tool may require independent thermal loops for chamber walls, electrostatic chucks, optical systems, chemicals, or other components. Independent temperature zones allow individual process conditions to be managed more precisely.
  • The increasing use of multi-channel architectures therefore supports higher-value cooling equipment and closer integration between chillers and semiconductor process-tool controls.

Refrigerant Regulation and Low-GWP Transition

  • Semiconductor process chillers often operate at temperatures below the range served by conventional industrial refrigeration. Historically, some of these applications have relied on refrigerants with relatively high global warming potential.
  • Changing refrigerant requirements are accelerating the development of lower-GWP alternatives. Suppliers are evaluating low-GWP refrigerants, natural CO2 systems, and non-refrigeration technologies such as thermoelectric cooling. The transition is technically challenging because replacement refrigerants must meet requirements for temperature range, pressure, efficiency, safety, and material compatibility.
  • The market is therefore entering a period of equipment redesign and qualification. Semiconductor manufacturers must ensure that alternative cooling systems maintain process stability and reliability before replacing established technologies.

Fab Energy-Efficiency Requirements

  • Process cooling is a significant contributor to fab energy consumption. Not every semiconductor process requires compressor-based refrigeration continuously. Where process requirements allow, facility process-cooling water can remove heat through cooling towers, mixed-mode systems, or centralized cooling infrastructure.
  • Hybrid and dual-cooled architectures allow fabs to use lower-energy heat rejection when conditions permit and reserve mechanical refrigeration for loads that require tighter temperature control. Heat exchangers and process-cooling-water interfaces are consequently gaining importance.
  • Variable-speed pumps, inverter compressors, thermoelectric systems, predictive controls, and heat recovery are also being used to reduce energy consumption without compromising temperature stability.

Market Restraints

  • The principal challenge is balancing temperature range, cooling capacity, response time, energy consumption, reliability, footprint, and refrigerant compliance. Deep-sub-zero systems can require complex multi-stage refrigeration and specialized heat-transfer fluids. Low-GWP alternatives can introduce pressure, flammability, material compatibility, or efficiency constraints.
  • Semiconductor manufacturers also require extremely high equipment uptime. Cooling equipment is directly connected to production tools, so failures or unstable temperatures can affect manufacturing operations. New refrigerants, cooling architectures, and thermal-control technologies therefore require extensive qualification before widespread deployment.
  • Retrofitting existing fabs can be difficult because process cooling is integrated with facility water, electrical infrastructure, process tools, and other utility systems. Replacing or modifying cooling equipment without disrupting production can require substantial engineering.
  • Energy reduction also presents a trade-off. Aggressive optimization cannot compromise the temperature stability required for process control and semiconductor yield. Operators must therefore evaluate energy savings against thermal performance and reliability.

Technology and Segment Insights

Cooling Architecture

  • Compressor-based process chillers remain the core category because they address a broad range of semiconductor applications. They provide independent temperature control for etch, deposition, lithography, cleaning, CMP, and test equipment.
  • Ultra-low-temperature chillers represent a growing high-value category. They serve advanced plasma etch, specialty deposition, and research applications that require deep-sub-zero temperatures. As semiconductor geometries become smaller and process windows become tighter, demand for these systems is expected to increase.
  • Thermoelectric chillers are relevant where compact size, precise control, and low maintenance are more important than very high cooling capacity. They can support etch, test, metrology, and compact OEM integration.
  • Liquid-to-liquid heat exchangers provide an efficient option where facility process-cooling water can meet the required temperature range. Their use supports fab-level energy optimization by reducing reliance on refrigeration.
  • Multi-channel temperature-control units are becoming more important as process tools require multiple independent thermal zones. Process-cooling-water interfaces and dual-cooled architectures provide a broader energy-efficiency layer by connecting tool-level cooling with facility infrastructure.

Temperature Range

  • Systems operating above 0°C serve applications with near-ambient or moderate temperature requirements. These include cleaning, CMP, deposition, lithography support, and testing.
  • Cooling from 0°C to -30°C addresses more demanding process requirements. The -30°C to -50°C range supports applications requiring deeper cooling, while systems below -50°C represent the most technically demanding category.
  • Ultra-low-temperature cooling is particularly relevant to advanced etch processes. Deeper features, higher aspect ratios, and tighter thermal windows are increasing the need for precise sub-zero control.

Semiconductor Process

  • Etch is a major application because plasma processes can create rapidly changing heat loads at the wafer chuck and chamber. Cooling systems must provide fast response and stable operation.
  • Deposition processes also require precise thermal control to maintain film characteristics and reaction conditions. Lithography and coat/develop applications require highly stable thermal and humidity conditions because temperature variations can affect overlay and resist behavior.
  • Cleaning and wet processes require controlled cooling for process chemicals and equipment. Ion implantation and annealing support systems require thermal management across defined temperature ranges. CMP requires stable cooling to support slurry behavior and process consistency.
  • Wafer testing and inspection add another layer of demand because semiconductor devices may need to be characterized across controlled temperature conditions.

Cooling Medium

  • Water and DI water are widely used where process requirements allow. Water-glycol mixtures provide additional temperature-range flexibility. Dielectric and specialty heat-transfer fluids are used where process conditions require specific thermal or material properties.
  • Refrigerant-based direct cooling remains important for applications requiring independent refrigeration and deeper temperature control. Refrigerant selection is becoming a strategic consideration as environmental requirements tighten.

Installation Type

  • OEM-integrated chillers represent a major installation category because semiconductor process tools often qualify cooling equipment together with the process platform. This makes supplier relationships with semiconductor equipment manufacturers important.
  • Fab retrofit and replacement activity provides an additional opportunity as existing facilities upgrade aging equipment, improve energy efficiency, or transition toward compliant refrigerant technologies.
  • Facility process-cooling-water integration is expanding as fabs seek to reduce refrigeration energy. Service and maintenance provide recurring revenue through equipment monitoring, repairs, optimization, and replacement components.

Regional Insights

  • Asia Pacific remains the largest market because it contains a major share of global wafer fabrication, memory production, and advanced packaging capacity. Taiwan, South Korea, Japan, and China operate dense semiconductor manufacturing clusters where large numbers of etch, deposition, cleaning, lithography, and testing tools require independent thermal-control systems.
  • Taiwan has a particularly strong opportunity due to its concentration of advanced logic and packaging capacity. The region also has a broad ecosystem of suppliers covering chillers, pumps, heat exchangers, thermal-control systems, and facility integration.
  • South Korea contributes through major memory and logic manufacturing capacity. Japan is important on both the demand and supply sides, with companies providing precision temperature-control products and semiconductor process equipment. China is expanding domestic semiconductor production while developing a growing local process-cooling supplier base.
  • Southeast Asia also contributes through semiconductor manufacturing and packaging activity. North America remains strategically important because of established semiconductor manufacturers, equipment OEMs, and new fab projects. Europe has a smaller manufacturing base but offers important opportunities for low-GWP and natural-refrigerant cooling solutions due to regulatory requirements.

Competitive and Strategic Outlook

  • The competitive landscape combines semiconductor-specialist chiller suppliers, precision temperature-control companies, and broader thermal-management providers. Key companies covered in the market include Shinwa Controls, FST, Ferrotec, Step Science, LNEYA, Mydax, SMC Corporation, LAUDA, JULABO, Huber, Solid State Cooling Systems, Advanced Energy, Boyd, Daikin Industries, and Mitsubishi Electric.
  • Competition is increasingly based on temperature range, cooling capacity at low temperatures, transient heat-load response, control stability, footprint, fluid compatibility, refrigerant strategy, reliability, and service coverage.
  • Shinwa Controls and FST have strong exposure to semiconductor equipment applications across etch, lithography, and testing. Ferrotec is expanding its multi-channel process cooling capabilities. Step Science is focusing on precision and energy-efficient cooling solutions.
  • LNEYA provides wide-temperature-range systems for lithography, etch, CVD, PVD, cleaning, testing, and packaging. Mydax supplies refrigerated chillers and liquid-to-liquid heat exchangers, including low-temperature systems. SMC, LAUDA, JULABO, and Huber participate through precision temperature-control platforms, while Advanced Energy provides adjacent measurement and control technologies.
  • Recent developments indicate that refrigerant transition and multi-zone control are becoming important areas of competition. Step Science introduced a semiconductor process chiller with inverter-based energy optimization and non-fluorocarbon or low-GWP refrigerant options in 2026. Ferrotec introduced a four-channel precision chiller for semiconductor cleaning equipment, providing independent temperature control across four loops.
  • The emergence of CO2-based R744 chillers for semiconductor etch and CVD also indicates movement toward natural refrigerants in suitable applications. At the same time, the availability of ultra-low-temperature systems demonstrates that deep-sub-zero requirements remain technically demanding.
  • The market is therefore moving toward more integrated thermal-management architectures. Suppliers that can combine precise temperature control, energy optimization, refrigerant compliance, multi-channel operation, OEM qualification, and global service capabilities will be positioned to address evolving fab requirements.

Conclusion

  • The Semiconductor Process Cooling Market is expanding as semiconductor manufacturing moves toward more complex process architectures and tighter thermal-control requirements. Advanced etch, deposition, lithography, cleaning, CMP, and testing processes are increasing demand for precise and responsive cooling.
  • Ultra-low-temperature chillers, multi-channel systems, thermoelectric technologies, liquid-to-liquid heat exchangers, and facility process-cooling-water interfaces are creating new technology opportunities. At the same time, low-GWP refrigerants and natural CO2 systems are gaining importance as environmental requirements evolve.
  • Asia Pacific remains the largest opportunity because of its extensive semiconductor manufacturing base and strong supplier ecosystem. North America and Europe offer additional opportunities through new fab investments, equipment upgrades, and refrigerant transitions. Competitive success will increasingly depend on thermal precision, energy efficiency, reliability, refrigerant strategy, OEM qualification, and lifecycle service capabilities.

Key Benefits of this Report

  • Insightful Analysis: Detailed market insights across regions, customer segments, policies, socio-economic factors, consumer preferences, and industry verticals.
  • Competitive Landscape: Understand strategic moves by key players to identify optimal market entry approaches.
  • Market Drivers and Future Trends: Assess major growth forces and emerging developments shaping the market.
  • Actionable Recommendations: Support strategic decisions to unlock new revenue streams.
  • Caters to a Wide Audience: Suitable for startups, research institutions, consultants, SMEs, and large enterprises.

What Businesses Use Our Reports For

  • Industry and market insights, opportunity assessment, product demand forecasting, market entry strategy, geographical expansion, capital investment decisions, regulatory analysis, new product development, and competitive intelligence.

Report Coverage

  • Historical data from 2021 to 2024, Base year 2025, and Forecast years from 2026 to 2032
  • Growth opportunities, challenges, supply chain outlook, regulatory framework, and trend analysis
  • Competitive positioning, strategies, and market share evaluation, and trade analysis
  • Revenue growth and forecast assessment across segments and regions
  • Company profiling including strategies, products, financials, and key developments

TABLE OF CONTENTS

1. Executive Summary

  • 1.1. Market Opportunity and Key Findings
  • 1.2. Semiconductor Process Thermal-Control Outlook
  • 1.3. Refrigerant and Energy-Efficiency Transition

2. Market Overview

  • 2.1. Fab Process-Cooling Architecture
  • 2.2. Tool-Level Chillers and Temperature-Control Units
  • 2.3. Process Cooling Water and Facility Integration
  • 2.4. Ultra-Low-Temperature Cooling
  • 2.5. Heat-Recovery and Energy-Efficient Cooling

3. Market Size and Forecast, 2026-2032

  • 3.1. Global Market Revenue
  • 3.2. Annual Growth Analysis
  • 3.3. Equipment, Integration and Service Revenue

4. Market by Cooling Architecture

  • 4.1. Compressor-Based Process Chillers
  • 4.2. Ultra-Low-Temperature Chillers
  • 4.3. Thermoelectric Chillers
  • 4.4. Liquid-to-Liquid Heat Exchangers
  • 4.5. Multi-Channel Temperature-Control Units
  • 4.6. Process-Cooling-Water Interfaces

5. Market by Temperature Range

  • 5.1. Above 0°C
  • 5.2. 0°C to -30°C
  • 5.3. -30°C to -50°C
  • 5.4. Below -50°C

6. Market by Semiconductor Process

  • 6.1. Etch
  • 6.2. Deposition
  • 6.3. Lithography and Coat/Develop
  • 6.4. Cleaning and Wet Process
  • 6.5. Ion Implantation and Annealing Support
  • 6.6. CMP
  • 6.7. Wafer Test and Inspection

7. Market by Cooling Medium

  • 7.1. Water and DI Water
  • 7.2. Water-Glycol Mixtures
  • 7.3. Dielectric and Specialty Heat-Transfer Fluids
  • 7.4. Refrigerant-Based Direct Cooling

8. Market by Installation Type

  • 8.1. OEM-Integrated Chillers
  • 8.2. Fab Retrofit and Replacement
  • 8.3. Facility PCW Integration
  • 8.4. Service and Maintenance

9. Regional Market

  • 9.1. Asia Pacific
    • 9.1.1. Taiwan
    • 9.1.2. South Korea
    • 9.1.3. Japan
    • 9.1.4. China
    • 9.1.5. Southeast Asia
  • 9.2. North America
    • 9.2.1. United States
  • 9.3. Europe
  • 9.4. Rest of World

10. Market Dynamics

  • 10.1. Drivers
    • 10.1.1. Advanced Etch and Deposition Thermal Requirements
    • 10.1.2. Higher Dynamic Heat Loads
    • 10.1.3. Low-GWP Refrigerant Transition
    • 10.1.4. Fab Energy-Efficiency Requirements
  • 10.2. Restraints
    • 10.2.1. Deep-Sub-Zero Refrigerant Constraints
    • 10.2.2. Qualification and Reliability Requirements
    • 10.2.3. Retrofit Integration Complexity
    • 10.2.4. Energy versus Temperature-Stability Trade-Off

11. Competitive Landscape

  • 11.1. Market Structure and Competitive Intensity
  • 11.2. Semiconductor-Specialist Chiller Suppliers
  • 11.3. Precision Temperature-Control Platforms
  • 11.4. Low-GWP and Natural-Refrigerant Strategies
  • 11.5. OEM Qualification and Service Networks

12. Company Profiles

  • 12.1. Shinwa Controls
  • 12.2. FST
  • 12.3. Ferrotec
  • 12.4. Step Science
  • 12.5. LNEYA
  • 12.6. Mydax
  • 12.7. SMC Corporation
  • 12.8. LAUDA
  • 12.9. JULABO
  • 12.10. Huber
  • 12.11. Solid State Cooling Systems
  • 12.12. Advanced Energy
  • 12.13. Boyd
  • 12.14. Daikin Industries
  • 12.15. Mitsubishi Electric

13. Recent Developments

14. Appendix

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