극자외선(EUV) 리소그래피 시장 규모, 점유율, 성장 및 세계 산업 분석 : 유형별 및 용도별, 지역별 인사이트와 예측(2026-2034년)

Growth Factors of extreme ultraviolet (EUV) lithography Market

The global extreme ultraviolet (EUV) lithography market is experiencing steady growth due to rising demand for advanced semiconductor nodes and increasing complexity in integrated circuit (IC) designs. According to Fortune Business Insights, the global EUV lithography market size was valued at USD 12.16 billion in 2025. The market is projected to grow from USD 13.27 billion in 2026 to USD 25.08 billion by 2034, registering a compound annual growth rate (CAGR) of 8.28% during the forecast period. Europe dominated the global market, accounting for 44.71% of the total market share in 2025, supported by a strong semiconductor R&D ecosystem and the presence of leading EUV technology providers.

EUV lithography uses extreme ultraviolet light to etch extremely small patterns onto semiconductor wafers, enabling the production of chips below 7 nanometers. This technology is essential for sustaining Moore's Law by increasing transistor density, performance, and energy efficiency in modern processors.

Impact of Generative AI on the EUV Lithography Market

Generative AI is playing a crucial role in improving EUV lithography processes by enhancing pattern optimization, defect detection, and design automation. By analyzing large datasets from prior manufacturing cycles, AI models generate optimized lithography patterns that reduce defects, improve yields, and minimize trial-and-error during production. These advancements significantly enhance process precision and throughput, thereby supporting the growth of the EUV lithography market globally.

Market Dynamics

Market Drivers

The rising complexity of integrated circuits is a key driver of EUV lithography adoption. As semiconductor manufacturers shift toward smaller feature sizes and higher transistor densities, traditional optical lithography struggles to meet resolution requirements. EUV lithography enables highly precise patterning, making it indispensable for advanced logic and memory chips. The growing demand for high-performance chips across applications such as artificial intelligence, 5G, data centers, and consumer electronics continues to fuel market growth.

Market Restraints

Despite its advantages, the high cost of EUV lithography systems remains a significant barrier. EUV tools are considerably more expensive than conventional lithography equipment due to complex components such as light sources, masks, pellicles, and photoresists. Additionally, technical challenges related to mask protection and industrial-scale deployment further increase implementation costs, limiting adoption among smaller semiconductor manufacturers.

Market Opportunities

The rapid expansion of data centers and advanced memory devices presents a major growth opportunity. EUV lithography supports the production of high-density NAND Flash and DRAM memory required for modern computing, cloud infrastructure, and enterprise storage. As demand for faster and energy-efficient memory rises, EUV technology is expected to gain further traction.

EUV Lithography Market Trends

A prominent trend shaping the market is the increasing demand for advanced semiconductor nodes, particularly 5nm and below. Leading semiconductor companies such as Samsung and TSMC are expanding their EUV capacity to support next-generation chip production. This focus on miniaturization and performance enhancement is a key factor driving sustained market progress.

Segmentation Analysis

By Equipment Type

The light source segment held the largest market share of 41.26% in 2026, driven by its critical role in enabling sub-10 nanometer patterning. Continuous innovations, government support for semiconductor R&D, and collaborations among manufacturers are supporting segment growth.

The mask segment is expected to record the highest CAGR during the forecast period due to increasing precision requirements in sub-7 nanometer chip manufacturing.

By End-User

The Integrated Device Manufacturer (IDM) segment dominated the market and is projected to capture 53.92% market share in 2026, as IDMs increasingly adopt EUV lithography to overcome power, performance, and area limitations.

The foundries segment is expected to grow at the highest CAGR of 12.27%, driven by rising demand for advanced semiconductors used in AI, smartphones, automotive, and high-performance computing applications.

Regional Outlook

Europe led the market with a valuation of USD 5.44 billion in 2025 and USD 6.02 billion in 2026, supported by strong investments in semiconductor manufacturing. Germany is projected to reach USD 1.39 billion in 2026, while France is valued at USD 1.11 billion in 2025.

Asia Pacific is the second-largest market, estimated at USD 3.73 billion in 2026, with the highest CAGR of 12.34%, driven by major foundries in China, Taiwan, and South Korea.

North America is projected to reach USD 1.89 billion in 2026, supported by demand for advanced computing and telecom devices.

The Middle East & Africa market is estimated to reach USD 0.96 billion in 2026, while the GCC market is valued at USD 0.29 billion in 2025.

Conclusion

In conclusion, the global EUV lithography market is set for steady growth from USD 12.16 billion in 2025 to USD 25.08 billion by 2034, driven by increasing semiconductor complexity, rising demand for advanced nodes, and expanding data center infrastructure. While high costs and technical challenges remain, continuous innovations, generative AI integration, and strong investments by key players such as ASML are expected to strengthen EUV lithography's role as a cornerstone technology in next-generation semiconductor manufacturing.

Segmentation By Equipment

• Light Source
• Optics
• Mask
• Others (Mirror, etc.)

By End-user

• Integrated Device Manufacturer
• Foundries

By Region

• North America (By Equipment, End-user, and Country)
  • U.S.
  • Canada
  • Mexico
• South America (By Equipment, End-user, and Country)
  • Brazil
  • Argentina
  • Rest of South America
• Europe (By Equipment, End-user, and Country)
  • Germany
  • France
  • Italy
  • Spain
  • Russia
  • Benelux
  • Nordics
  • Rest of Europe
• Middle East & Africa (By Equipment, End-user, and Country)
  • Turkey
  • Israel
  • GCC
  • South Africa
  • North Africa
  • Rest of the Middle East & Africa
• Asia Pacific (By Equipment, End-user, and Country)
  • China
  • India
  • Japan
  • South Korea
  • ASEAN
  • Oceania
  • Rest of Asia Pacific

Companies Profiled in the Report ASML (Netherlands), Samsung Electronics Co. Ltd. (South Korea), Canon Inc. (Japan), KLA Corporation (U.S.), NTT Advanced Technology Corporation (Japan), Nikon Corporation (China), ZEISS Group (Germany), ADVANTEST CORPORATION (Japan), SUSS MicroTec SE (Germany)

Table of Content

1. Introduction

• 1.1. Definition, By Segment
• 1.2. Research Methodology/Approach
• 1.3. Data Sources

2. Executive Summary

3. Market Dynamics

• 3.1. Macro and Micro Economic Indicators
• 3.2. Drivers, Restraints, Opportunities and Trends
• 3.3. Impact of Generative AI

4. Competition Landscape

• 4.1. Business Strategies Adopted by Key Players
• 4.2. Consolidated SWOT Analysis of Key Players
• 4.3. Global EUV Lithography Key Players (Top 3 - 5) Market Share/Ranking, 2025

5. Global EUV Lithography Market Size Estimates and Forecasts, By Segments, 2021-2034

• 5.1. Key Findings
• 5.2. By Equipment (USD)
  • 5.2.1. Light Source
  • 5.2.2. Optics
  • 5.2.3. Mask
  • 5.2.4. Others (Mirror, etc.)
• 5.3. By End-user (USD)
  • 5.3.1. Integrated Device Manufacturer
  • 5.3.2. Foundries
• 5.4. By Region (USD)
  • 5.4.1. North America
  • 5.4.2. South America
  • 5.4.3. Europe
  • 5.4.4. Middle East & Africa
  • 5.4.5. Asia Pacific

6. North America EUV Lithography Market Size Estimates and Forecasts, By Segments, 2021-2034

• 6.1. Key Findings
• 6.2. By Equipment (USD)
  • 6.2.1. Light Source
  • 6.2.2. Optics
  • 6.2.3. Mask
  • 6.2.4. Others (Mirror, etc.)
• 6.3. By End-user (USD)
  • 6.3.1. Integrated Device Manufacturer
  • 6.3.2. Foundries
• 6.4. By Country (USD)
  • 6.4.1. United States
  • 6.4.2. Canada
  • 6.4.3. Mexico

7. South America EUV Lithography Market Size Estimates and Forecasts, By Segments, 2021-2034

• 7.1. Key Findings
• 7.2. By Equipment (USD)
  • 7.2.1. Light Source
  • 7.2.2. Optics
  • 7.2.3. Mask
  • 7.2.4. Others (Mirror, etc.)
• 7.3. By End-user (USD)
  • 7.3.1. Integrated Device Manufacturer
  • 7.3.2. Foundries
• 7.4. By Country (USD)
  • 7.4.1. Brazil
  • 7.4.2. Argentina
  • 7.4.3. Rest of South America

8. Europe EUV Lithography Market Size Estimates and Forecasts, By Segments, 2021-2034

• 8.1. Key Findings
• 8.2. By Equipment (USD)
  • 8.2.1. Light Source
  • 8.2.2. Optics
  • 8.2.3. Mask
  • 8.2.4. Others (Mirror, etc.)
• 8.3. By End-user (USD)
  • 8.3.1. Integrated Device Manufacturer
  • 8.3.2. Foundries
• 8.4. By Country (USD)
  • 8.4.1. United Kingdom
  • 8.4.2. Germany
  • 8.4.3. France
  • 8.4.4. Italy
  • 8.4.5. Spain
  • 8.4.6. Russia
  • 8.4.7. Benelux
  • 8.4.8. Nordics
  • 8.4.9. Rest of Europe

9. Middle East & Africa EUV Lithography Market Size Estimates and Forecasts, By Segments, 2021-2034

• 9.1. Key Findings
• 9.2. By Equipment (USD)
  • 9.2.1. Light Source
  • 9.2.2. Optics
  • 9.2.3. Mask
  • 9.2.4. Others (Mirror, etc.)
• 9.3. By End-user (USD)
  • 9.3.1. Integrated Device Manufacturer
  • 9.3.2. Foundries
• 9.4. By Country (USD)
  • 9.4.1. Turkey
  • 9.4.2. Israel
  • 9.4.3. GCC
  • 9.4.4. North Africa
  • 9.4.5. South Africa
  • 9.4.6. Rest of MEA

10. Asia Pacific EUV Lithography Market Size Estimates and Forecasts, By Segments, 2021-2034

• 10.1. Key Findings
• 10.2. By Equipment (USD)
  • 10.2.1. Light Source
  • 10.2.2. Optics
  • 10.2.3. Mask
  • 10.2.4. Others (Mirror, etc.)
• 10.3. By End-user (USD)
  • 10.3.1. Integrated Device Manufacturer
  • 10.3.2. Foundries
• 10.4. By Country (USD)
  • 10.4.1. China
  • 10.4.2. India
  • 10.4.3. Japan
  • 10.4.4. South Korea
  • 10.4.5. ASEAN
  • 10.4.6. Oceania
  • 10.4.7. Rest of Asia Pacific

11. Company Profiles for Top 10 Players (Based on data availability in public domain and/or on paid databases)

• 11.1. ASML
  • 11.1.1. Overview
    • 11.1.1.1. Key Management
    • 11.1.1.2. Headquarters
    • 11.1.1.3. Offerings/Business Segments
  • 11.1.2. Key Details (Key details are consolidated data and not product/service specific)
    • 11.1.2.1. Employee Size
    • 11.1.2.2. Past and Current Revenue
    • 11.1.2.3. Geographical Share
    • 11.1.2.4. Business Segment Share
    • 11.1.2.5. Recent Developments
• 11.2. Samsung Groups Co. Ltd.
  • 11.2.1. Overview
    • 11.2.1.1. Key Management
    • 11.2.1.2. Headquarters
    • 11.2.1.3. Offerings/Business Segments
  • 11.2.2. Key Details (Key details are consolidated data and not product/service specific)
    • 11.2.2.1. Employee Size
    • 11.2.2.2. Past and Current Revenue
    • 11.2.2.3. Geographical Share
    • 11.2.2.4. Business Segment Share
    • 11.2.2.5. Recent Developments
• 11.3. Canon Inc.
  • 11.3.1. Overview
    • 11.3.1.1. Key Management
    • 11.3.1.2. Headquarters
    • 11.3.1.3. Offerings/Business Segments
  • 11.3.2. Key Details (Key details are consolidated data and not product/service specific)
    • 11.3.2.1. Employee Size
    • 11.3.2.2. Past and Current Revenue
    • 11.3.2.3. Geographical Share
    • 11.3.2.4. Business Segment Share
    • 11.3.2.5. Recent Developments
• 11.4. NTT Advanced Technology Corporation
  • 11.4.1. Overview
    • 11.4.1.1. Key Management
    • 11.4.1.2. Headquarters
    • 11.4.1.3. Offerings/Business Segments
  • 11.4.2. Key Details (Key details are consolidated data and not product/service specific)
    • 11.4.2.1. Employee Size
    • 11.4.2.2. Past and Current Revenue
    • 11.4.2.3. Geographical Share
    • 11.4.2.4. Business Segment Share
    • 11.4.2.5. Recent Developments
• 11.5. Nikon Corporation
  • 11.5.1. Overview
    • 11.5.1.1. Key Management
    • 11.5.1.2. Headquarters
    • 11.5.1.3. Offerings/Business Segments
  • 11.5.2. Key Details (Key details are consolidated data and not product/service specific)
    • 11.5.2.1. Employee Size
    • 11.5.2.2. Past and Current Revenue
    • 11.5.2.3. Geographical Share
    • 11.5.2.4. Business Segment Share
    • 11.5.2.5. Recent Developments
• 11.6. KLA Corporation
  • 11.6.1. Overview
    • 11.6.1.1. Key Management
    • 11.6.1.2. Headquarters
    • 11.6.1.3. Offerings/Business Segments
  • 11.6.2. Key Details (Key details are consolidated data and not product/service specific)
    • 11.6.2.1. Employee Size
    • 11.6.2.2. Past and Current Revenue
    • 11.6.2.3. Geographical Share
    • 11.6.2.4. Business Segment Share
    • 11.6.2.5. Recent Developments
• 11.7. ADVANTEST CORPORATION
  • 11.7.1. Overview
    • 11.7.1.1. Key Management
    • 11.7.1.2. Headquarters
    • 11.7.1.3. Offerings/Business Segments
  • 11.7.2. Key Details (Key details are consolidated data and not product/service specific)
    • 11.7.2.1. Employee Size
    • 11.7.2.2. Past and Current Revenue
    • 11.7.2.3. Geographical Share
    • 11.7.2.4. Business Segment Share
    • 11.7.2.5. Recent Developments
• 11.8. Ushio Inc.
  • 11.8.1. Overview
    • 11.8.1.1. Key Management
    • 11.8.1.2. Headquarters
    • 11.8.1.3. Offerings/Business Segments
  • 11.8.2. Key Details (Key details are consolidated data and not product/service specific)
    • 11.8.2.1. Employee Size
    • 11.8.2.2. Past and Current Revenue
    • 11.8.2.3. Geographical Share
    • 11.8.2.4. Business Segment Share
    • 11.8.2.5. Recent Developments
• 11.9. TOPPAN PHOTOMASKS
  • 11.9.1. Overview
    • 11.9.1.1. Key Management
    • 11.9.1.2. Headquarters
    • 11.9.1.3. Offerings/Business Segments
  • 11.9.2. Key Details (Key details are consolidated data and not product/service specific)
    • 11.9.2.1. Employee Size
    • 11.9.2.2. Past and Current Revenue
    • 11.9.2.3. Geographical Share
    • 11.9.2.4. Business Segment Share
    • 11.9.2.5. Recent Developments
• 11.10. SUSS MicroTec SE
  • 11.10.1. Overview
    • 11.10.1.1. Key Management
    • 11.10.1.2. Headquarters
    • 11.10.1.3. Offerings/Business Segments
  • 11.10.2. Key Details (Key details are consolidated data and not product/service specific)
    • 11.10.2.1. Employee Size
    • 11.10.2.2. Past and Current Revenue
    • 11.10.2.3. Geographical Share
    • 11.10.2.4. Business Segment Share
    • 11.10.2.5. Recent Developments

12. Key Takeaways