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1970554

극자외선 리소그래피 시장 규모, 점유율, 동향 및 성장 분석 보고서(2026-2034년)

Global Extreme Ultraviolet Lithography Market Size, Share, Trends & Growth Analysis Report 2026-2034

발행일: | 리서치사: Value Market Research | 페이지 정보: 영문 113 Pages | 배송안내 : 1-2일 (영업일 기준)

    
    
    




※ 본 상품은 영문 자료로 한글과 영문 목차에 불일치하는 내용이 있을 경우 영문을 우선합니다. 정확한 검토를 위해 영문 목차를 참고해주시기 바랍니다.

극자외선 리소그래피 시장 규모는 2025년 138억 9,000만 달러에서 2034년에는 613억 4,000만 달러에 이르고, 2026-2034년 CAGR 17.94%를 나타낼 전망입니다.

극자외선(EUV) 리소그래피 시장은 차세대 반도체 제조의 핵심으로, 7nm 이하의 첨단 노드를 생산할 수 있습니다. 단파장 EUV 빛을 활용함으로써 이 기술은 심자외선 리소그래피의 한계를 극복하고, 고해상도 확보, 멀티패터닝 공정의 감소, 칩 성능 향상을 실현합니다. 고성능 컴퓨팅, AI 가속기, 5G 인프라에 대한 수요가 급증하는 가운데 EUV 리소그래피는 첨단 반도체 제조의 기반이 될 것으로 예측됩니다.

앞으로의 성장은 데이터 중심 산업의 급격한 확장에 의해 촉진될 것입니다. 하이퍼스케일 데이터센터부터 엣지 컴퓨팅 디바이스까지 트랜지스터 밀도와 에너지 효율을 향상시킨 칩에 대한 수요는 지속적으로 증가하고 있습니다. EUV 리소그래피는 이러한 성능 요건을 충족시킬 뿐만 아니라 처리량 향상과 결함률 감소를 실현하여 무어의 법칙을 이어가는 데 필수적인 기술입니다. 장비 제조업체, 파운드리, 재료 공급업체 간의 공동 투자로 EUV 플랫폼의 상용화가 가속화되고, 페리클 내구성, 광원 출력, 마스크 충실도의 지속적인 개선이 추진되고 있습니다.

향후 EUV와 고NA(개구수) 광학의 통합으로 미세화 능력이 더욱 확장되어 2nm 이하 공정 노드로의 진입이 가능할 것으로 예측됩니다. 이러한 발전은 세계 반도체 공급망을 재구성하고, 자율 시스템, 고급 AI, 양자 컴퓨팅 분야에서 획기적인 발전을 가능하게 할 것입니다. 각국 및 기업들이 반도체 분야 주도권 확보를 위한 노력을 강화하는 가운데, EUV 리소그래피는 앞으로도 세계 혁신과 디지털 변혁을 뒷받침하는 중요한 전략 기술로 자리매김할 것입니다.

목차

제1장 서론

제2장 주요 요약

제3장 시장 변수, 동향, 프레임워크

제4장 세계의 극자외선 리소그래피 시장 : 기기별

제5장 세계의 극자외선 리소그래피 시장 : 최종 용도별

제6장 세계의 극자외선 리소그래피 시장 : 지역별

제7장 경쟁 구도

제8장 기업 개요

LSH 26.03.23

The Extreme Ultraviolet Lithography Market size is expected to reach USD 61.34 Billion in 2034 from USD 13.89 Billion (2025) growing at a CAGR of 17.94% during 2026-2034.

The extreme ultraviolet (EUV) lithography market is at the heart of next-generation semiconductor manufacturing, enabling the production of advanced nodes below 7nm. By leveraging short-wavelength EUV light, this technology overcomes the limitations of deep ultraviolet lithography, ensuring higher resolution, reduced multi-patterning steps, and improved chip performance. As demand for high-performance computing, AI accelerators, and 5G infrastructure surges, EUV lithography is poised to become the backbone of advanced semiconductor fabrication.

Future growth is fueled by the exponential rise of data-centric industries. From hyperscale data centers to edge computing devices, there is a relentless push for chips with higher transistor densities and improved energy efficiency. EUV lithography not only meets these performance requirements but also enhances throughput and reduces defect rates, making it indispensable for scaling Moore's Law. Collaborative investments between equipment manufacturers, foundries, and material suppliers are accelerating the commercialization of EUV platforms and driving continuous improvements in pellicle durability, light source power, and mask fidelity.

Looking ahead, the integration of EUV with high-NA (numerical aperture) optics is expected to further extend scaling capabilities, opening pathways to sub-2nm nodes. This progression will reshape the global semiconductor supply chain, enabling breakthroughs in autonomous systems, advanced AI, and quantum computing. As countries and corporations intensify efforts to secure semiconductor leadership, EUV lithography will remain a critical strategic technology underpinning innovation and digital transformation worldwide.

Our reports are meticulously crafted to provide clients with comprehensive and actionable insights into various industries and markets. Each report encompasses several critical components to ensure a thorough understanding of the market landscape:

Market Overview: A detailed introduction to the market, including definitions, classifications, and an overview of the industry's current state.

Market Dynamics: In-depth analysis of key drivers, restraints, opportunities, and challenges influencing market growth. This section examines factors such as technological advancements, regulatory changes, and emerging trends.

Segmentation Analysis: Breakdown of the market into distinct segments based on criteria like product type, application, end-user, and geography. This analysis highlights the performance and potential of each segment.

Competitive Landscape: Comprehensive assessment of major market players, including their market share, product portfolio, strategic initiatives, and financial performance. This section provides insights into the competitive dynamics and key strategies adopted by leading companies.

Market Forecast: Projections of market size and growth trends over a specified period, based on historical data and current market conditions. This includes quantitative analyses and graphical representations to illustrate future market trajectories.

Regional Analysis: Evaluation of market performance across different geographical regions, identifying key markets and regional trends. This helps in understanding regional market dynamics and opportunities.

Emerging Trends and Opportunities: Identification of current and emerging market trends, technological innovations, and potential areas for investment. This section offers insights into future market developments and growth prospects.

MARKET SEGMENTATION

By Equipment

  • Light Source
  • Optics
  • Mask
  • Others

By End-use

  • Integrated Device Manufacturer (IDM)
  • Foundries

COMPANIES PROFILED

  • ASML Holding NV, NTT Advanced Technology Corporation, Canon Inc, Nikon Corporation, Intel Corporation, Taiwan Semiconductor Manufacturing Company Limited, Samsung Electronics Co Ltd, Toppan Photomasks Inc, ZEISS Group, Ushio Inc
  • We can customise the report as per your requirements.

TABLE OF CONTENTS

Chapter 1. PREFACE

  • 1.1. Market Segmentation & Scope
  • 1.2. Market Definition
  • 1.3. Information Procurement
    • 1.3.1 Information Analysis
    • 1.3.2 Market Formulation & Data Visualization
    • 1.3.3 Data Validation & Publishing
  • 1.4. Research Scope and Assumptions
    • 1.4.1 List of Data Sources

Chapter 2. EXECUTIVE SUMMARY

  • 2.1. Market Snapshot
  • 2.2. Segmental Outlook
  • 2.3. Competitive Outlook

Chapter 3. MARKET VARIABLES, TRENDS, FRAMEWORK

  • 3.1. Market Lineage Outlook
  • 3.2. Penetration & Growth Prospect Mapping
  • 3.3. Value Chain Analysis
  • 3.4. Regulatory Framework
    • 3.4.1 Standards & Compliance
    • 3.4.2 Regulatory Impact Analysis
  • 3.5. Market Dynamics
    • 3.5.1 Market Drivers
    • 3.5.2 Market Restraints
    • 3.5.3 Market Opportunities
    • 3.5.4 Market Challenges
  • 3.6. Porter's Five Forces Analysis
  • 3.7. PESTLE Analysis

Chapter 4. GLOBAL EXTREME ULTRAVIOLET LITHOGRAPHY MARKET: BY EQUIPMENT 2022-2034 (USD MN)

  • 4.1. Market Analysis, Insights and Forecast Equipment
  • 4.2. Light Source Estimates and Forecasts By Regions 2022-2034 (USD MN)
  • 4.3. Optics Estimates and Forecasts By Regions 2022-2034 (USD MN)
  • 4.4. Mask Estimates and Forecasts By Regions 2022-2034 (USD MN)
  • 4.5. Others Estimates and Forecasts By Regions 2022-2034 (USD MN)

Chapter 5. GLOBAL EXTREME ULTRAVIOLET LITHOGRAPHY MARKET: BY END-USE 2022-2034 (USD MN)

  • 5.1. Market Analysis, Insights and Forecast End-use
  • 5.2. Integrated Device Manufacturer (IDM) Estimates and Forecasts By Regions 2022-2034 (USD MN)
  • 5.3. Foundries Estimates and Forecasts By Regions 2022-2034 (USD MN)

Chapter 6. GLOBAL EXTREME ULTRAVIOLET LITHOGRAPHY MARKET: BY REGION 2022-2034(USD MN)

  • 6.1. Regional Outlook
  • 6.2. North America Market Analysis, Insights and Forecast, 2022-2034 (USD MN)
    • 6.2.1 By Equipment
    • 6.2.2 By End-use
    • 6.2.3 United States
    • 6.2.4 Canada
    • 6.2.5 Mexico
  • 6.3. Europe Market Analysis, Insights and Forecast, 2022-2034 (USD MN)
    • 6.3.1 By Equipment
    • 6.3.2 By End-use
    • 6.3.3 United Kingdom
    • 6.3.4 France
    • 6.3.5 Germany
    • 6.3.6 Italy
    • 6.3.7 Russia
    • 6.3.8 Rest Of Europe
  • 6.4. Asia-Pacific Market Analysis, Insights and Forecast, 2022-2034 (USD MN)
    • 6.4.1 By Equipment
    • 6.4.2 By End-use
    • 6.4.3 India
    • 6.4.4 Japan
    • 6.4.5 South Korea
    • 6.4.6 Australia
    • 6.4.7 South East Asia
    • 6.4.8 Rest Of Asia Pacific
  • 6.5. Latin America Market Analysis, Insights and Forecast, 2022-2034 (USD MN)
    • 6.5.1 By Equipment
    • 6.5.2 By End-use
    • 6.5.3 Brazil
    • 6.5.4 Argentina
    • 6.5.5 Peru
    • 6.5.6 Chile
    • 6.5.7 South East Asia
    • 6.5.8 Rest of Latin America
  • 6.6. Middle East & Africa Market Analysis, Insights and Forecast, 2022-2034 (USD MN)
    • 6.6.1 By Equipment
    • 6.6.2 By End-use
    • 6.6.3 Saudi Arabia
    • 6.6.4 UAE
    • 6.6.5 Israel
    • 6.6.6 South Africa
    • 6.6.7 Rest of the Middle East And Africa

Chapter 7. COMPETITIVE LANDSCAPE

  • 7.1. Recent Developments
  • 7.2. Company Categorization
  • 7.3. Supply Chain & Channel Partners (based on availability)
  • 7.4. Market Share & Positioning Analysis (based on availability)
  • 7.5. Vendor Landscape (based on availability)
  • 7.6. Strategy Mapping

Chapter 8. COMPANY PROFILES OF GLOBAL EXTREME ULTRAVIOLET LITHOGRAPHY INDUSTRY

  • 8.1. Top Companies Market Share Analysis
  • 8.2. Company Profiles
    • 8.2.1 ASML Holding NV
    • 8.2.2 NTT Advanced Technology Corporation
    • 8.2.3 Canon Inc
    • 8.2.4 Nikon Corporation
    • 8.2.5 Intel Corporation
    • 8.2.6 Taiwan Semiconductor Manufacturing Company Limited
    • 8.2.7 Samsung Electronics Co. Ltd
    • 8.2.8 Toppan Photomasks Inc
    • 8.2.9 ZEISS Group
    • 8.2.10 Ushio Inc
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